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1. WO2019224564 - METHOD FOR PRODUCTION OF NANOMATERIAL IN VACUUM AND MAGNETRON SPATTERING DEVICE FOR ITS EMBODIMENT

Publication Number WO/2019/224564
Publication Date 28.11.2019
International Application No. PCT/GE2019/050002
International Filing Date 17.05.2019
IPC
C23C 14/35 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
35by application of a magnetic field, e.g. magnetron sputtering
H01J 37/34 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
34operating with cathodic sputtering
CPC
B22F 1/054
B22F 2009/0824
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
9Making metallic powder or suspensions thereof
02using physical processes
06starting from liquid material
08by casting, e.g. through sieves or in water, by atomising or spraying
082atomising using a fluid
0824with a specific atomising fluid
B22F 2999/00
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
2999Aspects linked to processes or compositions used in powder metallurgy
B22F 9/008
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
9Making metallic powder or suspensions thereof
002amorphous or microcrystalline
008Rapid solidification processing
B22F 9/082
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER
9Making metallic powder or suspensions thereof
02using physical processes
06starting from liquid material
08by casting, e.g. through sieves or in water, by atomising or spraying
082atomising using a fluid
B82Y 40/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
40Manufacture or treatment of nanostructures
Applicants
  • BERISHVILI, Zaur [GE]/[GE]
Inventors
  • BERISHVILI, Zaur
Priority Data
AP 2018 1479322.05.2018GE
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) METHOD FOR PRODUCTION OF NANOMATERIAL IN VACUUM AND MAGNETRON SPATTERING DEVICE FOR ITS EMBODIMENT
(FR) PROCÉDÉ DE PRODUCTION DE NANOMATÉRIAU SOUS VIDE ET DISPOSITIF DE PULVÉRISATION DE MAGNÉTRONS POUR SON MODE DE RÉALISATION
Abstract
(EN) The method of production of nanomaterial and magnetron sputtering device for its embodiment are presented. The method involves the formation of an active sputtering zone on the disk target surface by means of a rotation magnetic field with a configuration of closed loop, consisting of the involutes of the circumference of a circle of specific radius; the formation of the gas discharge of the said loop shape and toroidal magnetron plasma over the active sputtering zone; ionization of atoms of working gas in the plasma region, their acceleration and bombardment of the target by the obtained ions to form and disperse the cathode spots on its surface; supply of the formed liquid material of the disk target to the plasma region, its cascading decay under conditions of recharging of liquid macrodroplets in the plasma and development of Rayleigh or capillary instability, and cooling and curing of formed nanoparticles outside the plasma region. The magnetron sputtering device contains the vacuum chamber (1) in which the anode (2), the cathode assembly (3) with the disk target (5), the magnetic system with groups of magnets (8) and its rotation rate control unit (15), and the system of liquid cooling of the cathode assembly (4) are located. The possibility of rotation of the magnetic system assisted by the coolant jet in the cooling system is provided. The like poles of each group are located along the corresponding closed loop, consisting of the involutes of the circumference of a circle of specific radius. The control unit contains the housing (16) which rotates along with the magnetic system, permanent magnets (17) and the brake ring (18), the fixed magnetic sensor (20) and piezoelectric elements (21).
(FR) Procédé de production de nanomatériau et dispositif de pulvérisation de magnétrons pour son mode de réalisation Le procédé implique la formation d'une zone de pulvérisation active sur la surface cible de disque au moyen d'un champ magnétique de rotation ayant une configuration de boucle fermée, constituée des volutes de la circonférence d'un cercle de rayon spécifique ; la formation de la décharge de gaz de ladite forme de boucle et de plasma de magnétron toroïdal sur la zone de pulvérisation active ; l'ionisation d'atomes de gaz de travail dans la région de plasma, leur accélération et le bombardement de la cible par les ions obtenus pour former et disperser les points de cathode sur sa surface ; la fourniture du matériau liquide formé de la cible de disque à la région de plasma, sa décroissance en cascade dans des conditions de recharge de macro-gouttelettes de liquide dans le plasma et le développement d'instabilité de Rayleigh ou capillaire, et le refroidissement et le durcissement de nanoparticules formées à l'extérieur de la région de plasma. Le dispositif de pulvérisation de magnétrons contient la chambre de vide (1) dans laquelle se situent l'anode (2), l'ensemble cathode (3) avec la cible de disque (5), le système magnétique comportant des groupes d'aimants (8) et son unité de commande de vitesse de rotation (15), et le système de refroidissement liquide de l'ensemble cathode (4). La possibilité de rotation du système magnétique assistée par le jet de liquide de refroidissement dans le système de refroidissement est prévue. Les pôles similaires de chaque groupe sont situés le long de la boucle fermée correspondante, constitués des volutes de la circonférence d'un cercle de rayon spécifique. L'unité de commande contient le boîtier (16) qui tourne avec le système magnétique, des aimants permanents (17) et l'anneau de frein (18), le capteur magnétique fixe (20) et des éléments piézoélectriques (21).
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