Processing

Please wait...

Settings

Settings

Goto Application

1. WO2019187902 - VAPOR DEPOSITION APPARATUS AND METHOD FOR PRODUCING ORGANIC ELECTRONIC DEVICE

Publication Number WO/2019/187902
Publication Date 03.10.2019
International Application No. PCT/JP2019/007301
International Filing Date 26.02.2019
IPC
C23C 14/24 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
C23C 14/12 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
12Organic material
H05B 6/04 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
6Heating by electric, magnetic, or electromagnetic fields
02Induction heating
04Sources of current
CPC
C23C 14/12
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
12Organic material
C23C 14/24
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
H05B 6/04
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
6Heating by electric, magnetic, or electromagnetic fields
02Induction heating
04Sources of current
Applicants
  • 公益財団法人福岡県産業・科学技術振興財団 FUKUOKA INDUSTRY, SCIENCE & TECHNOLOGY FOUNDATION [JP]/[JP]
Inventors
  • 小林 慎一郎 KOBAYASHI Shinichiro
  • 藤本 弘 FUJIMOTO Hiroshi
  • 宮崎 浩 MIYAZAKI Hiroshi
Agents
  • 峰 雅紀 MINE Masaki
Priority Data
2018-06336828.03.2018JP
2018-22536130.11.2018JP
2018-22536230.11.2018JP
2018-22536330.11.2018JP
2018-22536430.11.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) VAPOR DEPOSITION APPARATUS AND METHOD FOR PRODUCING ORGANIC ELECTRONIC DEVICE
(FR) APPAREIL DE DÉPÔT EN PHASE VAPEUR ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ORGANIQUE ÉLECTRONIQUE
(JA) 蒸着装置及び有機電子デバイスの生産方法
Abstract
(EN)
The purpose of the present invention is to provide: a practical vapor deposition apparatus which is suppressed in noise during the formation of a film of an organic material by means of induction heating; and the like. A vapor deposition apparatus for forming a film of an organic material on a substrate, which is provided with: a container, at least a part of which is configured from a conductor, and which contains the organic material; a coil which is arranged around the container; a power semiconductor which is connected to the coil; and a direct-current power supply which is connected to the power semiconductor. This vapor deposition apparatus is configured such that the power semiconductor functions as a transistor that constitutes a part of an inverter part which converts a direct current into an alternating current. By using a power semiconductor and a direct-current power supply, a large-sized alternating-current power supply becomes unnecessary. Consequently, it becomes easy for this vapor deposition apparatus to have a compact configuration.
(FR)
Le but de la présente invention est de fournir : un appareil de dépôt en phase vapeur pratique dont le bruit est supprimé pendant la formation d'un film d'un matériau organique au moyen d'un chauffage par induction; et similaire. L'invention concerne un appareil de dépôt en phase vapeur pour former un film d'un matériau organique sur un substrat, qui comporte : un récipient, dont au moins une partie est conçue à partir d'un conducteur, et qui contient le matériau organique; une bobine qui est disposée autour du récipient; un semi-conducteur de puissance qui est connecté à la bobine; et une alimentation électrique en courant continu qui est connectée au semi-conducteur de puissance. L'appareil de dépôt en phase vapeur selon l'invention est conçu de telle sorte que le semi-conducteur de puissance fonctionne comme un transistor qui constitue une partie d'une partie d'onduleur qui convertit un courant continu en un courant alternatif. Grâce à l'utilisation d'un semi-conducteur de puissance et d'une alimentation électrique en courant continu, une alimentation électrique en courant alternatif de grande taille devient inutile. Par conséquent, une configuration compacte pour cet appareil de dépôt en phase vapeur devient facile.
(JA)
本発明は、誘導加熱方式で有機材料を製膜する上で、ノイズを抑えて実用的な蒸着装置等を提供することを目的とする。 有機材料を基板に製膜する蒸着装置であって、少なくとも一部が導体で構成されている前記有機材料を収納する容器と、前記容器の周囲に配置されているコイルと、前記コイルに接続しているパワー半導体と、前記パワー半導体に接続している直流電源とを備え、前記パワー半導体は、直流を交流に変換するインバータ部の一部を構成するトランジスタとして機能する、蒸着装置である。パワー半導体と直流電源を用いることにより、大型の交流電源が不要となる。そのため、蒸着装置をコンパクトに構成することが容易となる。
Latest bibliographic data on file with the International Bureau