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1. (WO2019088833) PROBE, METHOD OF MANUFACTURING A PROBE AND SCANNING PROBE MICROSCOPY SYSTEM
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Claims

1. Probe for use in a scanning probe microscopy device for measuring features on a surface of a substrate, the probe comprising a cantilever and a probe tip, the probe tip being located at a first end section of the cantilever, the cantilever having a second end section on an opposite side, and the cantilever having a longitudinal shape, wherein the cantilever is configured for bending in a Z-direction perpendicular to the surface of the substrate in use,

wherein the cantilever comprises a neck section and a paddle section, wherein the probe tip is located on the paddle section, and wherein the neck section has a width and height in cross section thereof,

wherein the neck section comprises a base part having a rectangular cross section, and wherein the cantilever at least across a length of the neck section comprises a ridge extending in a direction away from the base part, such that the base part and the ridge together define the width and height of the neck section, wherein the ridge and the base part have dimensions such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction.

2. Probe according to claim 1, wherein the ridge extends between the probe tip and the second end section of the cantilever.

3. Probe according to claim 1 or 2, wherein the neck section is formed by the base part and the ridge and has a T-shaped cross-section.

4. Probe according to any of the claims 1-3, wherein a width to height aspect ratio of the neck section is defined as a ratio between a maximum width and a maximum height measured in cross section transverse to a notional longitudinal axis through the neck section and

calculated as the maximum width divided by the maximum height, wherein the cantilever comprises at least one section having a width to height aspect ratio smaller than 10, preferably smaller than 5.5, more preferably smaller than 3.

5. Probe according to any of the preceding claims, wherein at least one of:

the width of the neck section is within a range of lmicrometer to 15 micrometer, such as 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, or 14

micrometer; or

a thickness of the base part, as measure transverse to the width, is within a range of 250 nanometer to 1250 nanometer, such as 250 nanometer, 500 nanometer, 750 nanometer, 1000 nanometer, or 1250 nanometer; or

a length of the neck section is within a range of 2.5 to 30 micrometer, such as 2.5 micrometer, 5 micrometer, 7.5 micrometer, 10 micrometer, 12.5 micrometer, 15 micrometer, 17.5 micrometer, 20

micrometer, 22.5 micrometer, 25 micrometer, 27.5 micrometer, or 30 micrometer; or

the height of the ridge is within a range of 2 to 14 micrometer, such as 2 micrometer, 3 micrometer, 4 micrometer, 6 micrometer, 8 micrometer, 10 micrometer, 12 micrometer, or 14 micrometer; or

the width of the ridge is within a range of 0.5 to 5 micrometer, such as 0.5, 1, 1.5, 2, 3, 4, or 5 micrometer, preferably 1.5 micrometer; or a length of the ridge is within a range of 2.5 to 30 micrometer, such as 2.5 micrometer, 5 micrometer, 7.5 micrometer, 10 micrometer, 12.5 micrometer, 15 micrometer, 17.5 micrometer, 20 micrometer, 22.5

micrometer, 25 micrometer, 27.5 micrometer, or 30 micrometer.

6. Probe according to any of the preceding claims, wherein the height of the ridge is 1.5 micrometer, and wherein at least one of:

the width of the neck section is 3 micrometer and the length of the neck section is 30 micrometer; or

the width of the neck section is 3 micrometer and the length of the neck section is 17.5 micrometer; or

the width of the neck section is 4 micrometer and the length of the neck section is 17.5 micrometer; or

the width of the neck section is 6 micrometer and the length of the neck section is 7.5 micrometer; or

the width of the neck section is 8 micrometer and the length of the neck section is 7.5 micrometer; or

the width of the neck section is 14 micrometer and the length of the neck section is 2.5 micrometer.

7. Probe according to any of the preceding claims, wherein the probe tip comprises a triangular cross section having a base width and an apex.

8. Probe according to claim 7, wherein the probe tip further comprises a high aspect ratio whisker extending from the apex.

9. Probe according to claim 8, wherein the lateral stiffness of the cantilever is of a same order as a lateral stiffness of the whisker, such as within 125% of the lateral stiffness of the whisker or smaller than or equal to the lateral stiffness of the whisker.

10. Method of manufacturing a probe for use in a scanning probe microscopy device for measuring high aspect ratio features on a surface of a substrate, the method comprising the steps of:

providing the probe to comprise a cantilever and a probe tip, wherein the probe tip is located at a first end section of the cantilever and wherein the cantilever has a second end section on an opposite side, wherein the cantilever is formed to have a longitudinal shape for enabling bending in a Z -direction perpendicular to the surface of the substrate in use,

wherein the step of providing the probe comprises:

forming the cantilever to comprise a neck section and a paddle section, and forming the probe tip to be located on the paddle section, and wherein the neck section is formed to have a width and height in cross section thereof, and wherein the width and height of the neck section are dimensioned such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction.

11. Method according to claim 10, wherein the step of forming of the cantilever comprises at least one or all of:

adjusting a cross sectional shape of the cantilever;

forming the cantilever to have a neck section comprising a ridge extending transverse to a base part of the neck section;

forming the cantilever to have a neck section comprising at least a base part and adjusting a thickness of the base part.

12. Method according to claim 11, wherein the step of forming of the cantilever comprises forming the cantilever to have a neck section

comprising a ridge extending transverse to a base part of the neck section, wherein the neck section is formed to have a T-shaped cross section.

13. Method according to any of the claims 10-12, wherein the probe tip is formed to comprise a whisker element, further comprising forming the cantilever to comprise the lateral stiffness to be of a same order as a lateral stiffness of the whisker element, such as within 125% of the lateral stiffness of the whisker element or smaller than or equal to the lateral stiffness of the whisker element.

14. Method according to claim 13, wherein the width and height of the neck section are dimensioned such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches the lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction such as to be at least one of:

within a factor 10 from each other;

within a factor 5 from each other;

within a factor 2 from each other;

within a range of 25% from each other; or

within a range of 5% from each other.

15. Method according to any of the claims 10-14, wherein the neck section is formed comprising a base part having a rectangular cross section, and wherein the cantilever is formed to comprise a ridge at least across a length of the neck section, the ridge extending in a direction away from the base part, such that the base part and the ridge together define the width and height of the neck section, wherein the ridge and the base part have dimensions such that the vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction.

16. Scanning probe microscopy system configured for measuring high aspect ratio features on a surface of a substrate, the system comprising a probe according to any of the claims 1-9.