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1. (WO2019077144) METHOD FOR MANUFACTURING A MICROSTRUCTURED DEVICE AND ASSOCIATED IMPLEMENTATION DEVICES
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/077144 International Application No.: PCT/EP2018/078796
Publication Date: 25.04.2019 International Filing Date: 19.10.2018
IPC:
B81C 99/00 (2010.01) ,B81C 1/00 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
81
MICRO-STRUCTURAL TECHNOLOGY
C
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICRO-STRUCTURAL DEVICES OR SYSTEMS
99
Subject matter not provided for in other groups of this subclass
B PERFORMING OPERATIONS; TRANSPORTING
81
MICRO-STRUCTURAL TECHNOLOGY
C
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICRO-STRUCTURAL DEVICES OR SYSTEMS
1
Manufacture or treatment of devices or systems in or on a substrate
Applicants:
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES [FR/FR]; 25, rue Leblanc Bâtiment « Le Ponant D » 75015 PARIS, FR
UNIVERSITE DE VERSAILLES SAINT-QUENTIN-EN-YVELINES [FR/FR]; 55 Avenue de Paris 78035 VERSAILLES CEDEX, FR
Inventors:
MALLOGGI, Florent; FR
BROSSARD, Rémy; FR
Agent:
GEVERS & ORES; Immeuble Palatin 2 3 Cours du Triangle CS 80165 92939 Paris La Défense Cedex, FR
Priority Data:
175983219.10.2017FR
Title (EN) METHOD FOR MANUFACTURING A MICROSTRUCTURED DEVICE AND ASSOCIATED IMPLEMENTATION DEVICES
(FR) PROCEDE DE FABRICATION D'UN DISPOSITIF MICROSTRUCTURE ET DISPOSITIFS DE MISE EN ŒUVRE ASSOCIES
Abstract:
(EN) The invention relates to a method for manufacturing a microstructured device comprising the following steps: a) supplying a substrate; b) printing a non-solid ink on the substrate, the ink solidifying in contact with the substrate in order to form a negative pattern of at least one microstructure of the microstructured device to be manufactured; c) covering the ink in solid form with a polymer that is non-crosslinked and comprises an additive able to allow crosslinking of said polymer, said polymer being immiscible with the pattern obtained in step b) in order to form a cover for the pattern, said polymer having a melting temperature that is strictly greater than the sublimation or evaporation temperature of the ink forming the pattern; d) crosslinking the cover; then e) subliming or, depending on the type of ink, liquefying then evaporating the ink so as to form the microstructured device comprising said at least one microstructure. The invention also relates to devices for implementing the method according to the invention.
(FR) L'invention concerne un procédé de fabrication d'un dispositif micro structuré comprenant les étapes suivantes : a) fournir un substrat; b) imprimer une encre, non solide, sur le substrat, l'encre se solidifiant au contact du substrat pour former un motif en négatif d'au moins une microstructure du dispositif microstructuré à fabriquer; c) envelopper l'encre sous forme solide avec un polymère non réticulé et comportant un additif apte à permettre une réticulation dudit polymère, ledit polymère étant non miscible avec le motif obtenu à l'étape b) afin de former une enveloppe pour le motif, ledit polymère présentant une température de fusion strictement supérieure à la température de sublimation ou d'évaporation de l'encre formant le motif; d) réticuler l'enveloppe; puis e) sublimer ou, selon la nature de l'encre, liquéfier puis évaporer l'encre de sorte à former le dispositif microstructuré comportant ladite au moins une micro structure. L'invention concerne également des dispositifs de mise en œuvre du procédé selon l'invention.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)