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1. (WO2019067444) SYSTEMS AND METHODS FOR TREATING SUBSTRATES WITH CRYOGENIC FLUID MIXTURES
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Pub. No.: WO/2019/067444 International Application No.: PCT/US2018/052643
Publication Date: 04.04.2019 International Filing Date: 25.09.2018
IPC:
H01L 21/02 (2006.01) ,H01L 21/67 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
Applicants:
TEL FSI, INC. [US/US]; 3455 Lyman Boulevard Chaska, Minnesota 55318, US
Inventors:
DEKRAKER, David P.; US
Agent:
KAGAN, David, B.; US
BERGER, Scott A.; US
BINDER, Mark, W.; US
BJORKMAN, Dale, A.; US
BUSSE, Paul, B.; US
DAHL, Philip Y.; US
D'SOUZA, Tanya S.; US
HAKAMAKI, Michaele, A.; US
PARINS, Paul, J.; US
JIMENEZ, Jose, W.; US
SARAGENO, Lori S.; US
SCHULTE, Daniel, C.; US
WARNER, Elizabeth A.; US
WEAVER, Paul, L.; US
Priority Data:
15/721,39629.09.2017US
Title (EN) SYSTEMS AND METHODS FOR TREATING SUBSTRATES WITH CRYOGENIC FLUID MIXTURES
(FR) SYSTÈMES ET PROCÉDÉS DE TRAITEMENT DE SUBSTRATS AU MOYEN DE MÉLANGES DE FLUIDES CRYOGÉNIQUES
Abstract:
(EN) Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to treat an exposed surface of the microelectronic substrate. The fluid mixture may be expanded through a nozzle to form an aerosol spray or gas cluster jet (GCJ) spray may impinge the microelectronic substrate and remove particles from the microelectronic substrate's surface. In one embodiment, the process conditions may be varied between subsequent treatments of a single substrate to target different types of particles with each treatment.
(FR) L'invention concerne des systèmes et des procédés permettant de traiter la surface d'un substrat microélectronique, et en particulier, un appareil et un procédé qui permettent de balayer le substrat microélectronique avec un mélange de fluides cryogéniques utilisé pour traiter une surface exposée du substrat microélectronique. Le mélange de fluides peut être répandu au moyen d'une buse pour former une pulvérisation aérosol ou une pulvérisation par jet d'amas gazeux (GCJ), peut entrer en contact avec le substrat microélectronique et éliminer des particules de la surface du substrat microélectronique. Selon un mode de réalisation, les conditions de traitement peuvent être modifiées entre des traitements ultérieurs d'un seul substrat de façon à cibler différents types de particules au moyen de chaque traitement.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)