Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019067376) HERMETIC SEALING OF A NONLINEAR CRYSTAL FOR USE IN A LASER SYSTEM
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/067376 International Application No.: PCT/US2018/052508
Publication Date: 04.04.2019 International Filing Date: 25.09.2018
IPC:
G03F 7/20 (2006.01) ,H01L 21/66 (2006.01) ,H01L 21/67 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66
Testing or measuring during manufacture or treatment
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
Applicants:
KLA-TENCOR CORPORATION [US/US]; Legal Department One Technology Drive Milpitas, California 95035, US
Inventors:
PATIL, Rajeev; US
RAMIREZ, David; US
CHURIN, Yevgeniy; US
REPLOGLE, William; US
Agent:
MCANDREWS, Kevin; US
MORRIS, Elizabeth M.N.; US
Priority Data:
16/133,61117.09.2018US
62/564,48728.09.2017US
Title (EN) HERMETIC SEALING OF A NONLINEAR CRYSTAL FOR USE IN A LASER SYSTEM
(FR) SCELLEMENT HERMÉTIQUE D’UN CRISTAL NON LINÉAIRE UTILISABLE DANS UN SYSTÈME LASER
Abstract:
(EN) Disclosed are methods and apparatus for hermetically sealing a nonlinear optical (NLO) crystal for use in a laser system. A mounted NLO crystal, an enclosure base, a lid, and a plurality of window components are moved into an oven. A vacuum bake process is then performed on the mounted NLO crystal, enclosure base, lid, and plurality of window components until a humidity level that is less than a predefined amount is reached. The mounted NLO crystal, enclosure base, lid, and plurality of window components are moved from the oven onto a stage of a glove box that includes a sealing tool. In the glove box, the mounted NLO crystal is hermetically sealed into the enclosure base by sealing the lid and plurality of window components into openings of the enclosure base.
(FR) L’invention concerne des procédés et un appareil de scellement hermétique d’un cristal optique non linéaire (NLO) utilisable dans un système laser. Un cristal NLO monté, une base d’enceinte, un couvercle, et une pluralité de composants de fenêtres sont déplacés dans un four. Un processus de cuisson sous vide est alors conduit sur le cristal NLO monté, la base d’enceinte, le couvercle et la pluralité de composants de fenêtres jusqu’à ce qu’un niveau d’humidité qui est inférieur à une quantité prédéfinie soit atteint. Le cristal NLO monté, la base d’enceinte, le couvercle et la pluralité de composants de fenêtres sont déplacés hors du four sur un étage d’une boîte à gants qui inclut un outil de scellement. Dans la boîte à gants, le cristal NLO monté est scellé hermétiquement dans la base d’enceinte en scellant le couvercle et la pluralité de composants de fenêtres dans des ouvertures de la base d’enceinte.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)