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1. (WO2019067375) DETECTION AND MEASUREMENT OF DIMENSIONS OF ASYMMETRIC STRUCTURES
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Pub. No.: WO/2019/067375 International Application No.: PCT/US2018/052507
Publication Date: 04.04.2019 International Filing Date: 25.09.2018
IPC:
H01L 21/66 (2006.01) ,G01D 21/02 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66
Testing or measuring during manufacture or treatment
G PHYSICS
01
MEASURING; TESTING
D
MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED BY A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; TRANSFERRING OR TRANSDUCING ARRANGEMENTS NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
21
Measuring or testing not otherwise provided for
02
Measuring two or more variables by means not covered by a single other subclass
Applicants:
KLA-TENCOR CORPORATION [US/US]; Legal Department One Technology Drive Milpitas, California 95035, US
Inventors:
ATKINS, Phillip R.; US
DAI, Qi; US
LEE, Lie-Quan Rich; US
Agent:
MCANDREWS, Kevin; US
MORRIS, Elizabeth M.N.; US
Priority Data:
16/138,81321.09.2018US
62/564,11927.09.2017US
Title (EN) DETECTION AND MEASUREMENT OF DIMENSIONS OF ASYMMETRIC STRUCTURES
(FR) DÉTECTION ET MESURE DE DIMENSIONS DE STRUCTURES ASYMÉTRIQUES
Abstract:
(EN) Methods and systems for performing spectroscopic measurements of asymmetric features of semiconductor structures are presented herein. In one aspect, measurements are performed at two or more azimuth angles to ensure sensitivity to an arbitrarily oriented asymmetric feature. Spectra associated with one or more off-diagonal Mueller matrix elements sensitive to asymmetry are integrated over wavelength to determine one or more spectral response metrics. In some embodiments, the integration is performed over one or more wavelength sub-regions selected to increase signal to noise ratio. Values of parameters characterizing an asymmetric feature are determined based on the spectral response metrics and critical dimension parameters measured by traditional spectral matching based techniques.
(FR) La présente invention concerne des procédés et des systèmes permettant d'effectuer des mesures spectroscopiques d’éléments asymétriques de structures semi-conductrices. Selon un aspect, des mesures sont effectuées au niveau de deux ou plusieurs angles d'azimut pour garantir une sensibilité à un élément asymétrique orienté arbitrairement. Des spectres associés à un ou plusieurs éléments de matrice de Mueller hors diagonale sensibles à une asymétrie sont intégrés sur la longueur d'onde pour déterminer une ou plusieurs métriques de réponse spectrale. Dans certains modes de réalisation, l'intégration est effectuée sur une ou plusieurs sous-régions de longueur d'onde sélectionnées pour augmenter le rapport signal sur bruit. Des valeurs de paramètres caractérisant un élément asymétrique sont déterminées sur la base des métriques de réponse spectrale et des paramètres de dimension critique mesurés par des techniques basées sur une correspondance spectrale classique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)