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1. (WO2019067331) SYSTEMS AND METHODS FOR METROLOGY BEAM STABILIZATION
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Pub. No.: WO/2019/067331 International Application No.: PCT/US2018/052334
Publication Date: 04.04.2019 International Filing Date: 24.09.2018
IPC:
G01N 21/88 (2006.01) ,G01B 11/27 (2006.01) ,G01N 21/21 (2006.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
26
for measuring angles or tapers; for testing the alignment of axes
27
for testing the alignment of axes
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
17
Systems in which incident light is modified in accordance with the properties of the material investigated
21
Polarisation-affecting properties
Applicants:
KLA-TENCOR CORPORATION [US/US]; One Technology Drive Milpitas, California 95035, US
Inventors:
BLASENHEIM, Barry; US
SAPIENS, Noam; US
FRIEDMANN, Michael; US
Agent:
MCANDREWS, Kevin; US
MORRIS, Elizabeth M.N.; US
Priority Data:
16/033,51112.07.2018US
62/563,58026.09.2017US
Title (EN) SYSTEMS AND METHODS FOR METROLOGY BEAM STABILIZATION
(FR) SYSTÈMES ET PROCÉDÉS DE STABILISATION DE FAISCEAU DE MÉTROLOGIE
Abstract:
(EN) Methods and systems for measuring a specimen while actively stabilizing an optical measurement beam subject to changes in polarization by a rotating polarizer element are described herein. Movement of a focused measurement beam spot induced by a rotating polarizer element is compensated by actively controlling the position of an optical element in the beam path based on measurements of the focused measurement beam spot. Both feedback and feedforward control schemes may be employed to reduce beam position error. In one aspect, a measurement system includes a rotating optical polarizer, a beam position sensor, and an active beam compensating element in the illumination beam path, the collection beam path, or both. Beam position errors are detected by the beam position sensor, and control commands are communicated to the active beam compensating element to reduce the measured beam position errors.
(FR) L'invention concerne des procédés et des systèmes permettant de mesurer un échantillon tout en stabilisant activement un faisceau de mesure optique soumis à des changements de polarisation par l'intermédiaire d'un élément polariseur rotatif. Le mouvement d'un point de faisceau de mesure focalisé induit par un élément polariseur rotatif est compensé par la commande active de la position d'un élément optique dans le trajet de faisceau en fonction de mesures du point de faisceau de mesure focalisé. Des procédés de commande de rétroaction et de correction aval peuvent être utilisés afin de réduire une erreur de position de faisceau. Selon un aspect, un système de mesure comprend un polariseur optique rotatif, un capteur de position de faisceau et un élément de compensation de faisceau actif dans le trajet de faisceau d'éclairage, le trajet de faisceau de collecte, ou les deux. Des erreurs de position de faisceau sont détectées par le capteur de position de faisceau, et des commandes de commande sont communiquées à l'élément de compensation de faisceau actif afin de réduire les erreurs de position de faisceau mesurées.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)