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1. (WO2019067323) SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL
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Pub. No.: WO/2019/067323 International Application No.: PCT/US2018/052246
Publication Date: 04.04.2019 International Filing Date: 21.09.2018
IPC:
H01L 21/67 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
Applicants:
LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway Fremont, California 94538, US
Inventors:
GREGOR, Mariusch; US
Agent:
WIGGINS, Michael D.; US
Priority Data:
62/563,12926.09.2017US
62/590,81527.11.2017US
Title (EN) SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL
(FR) SYSTÈMES ET PROCÉDÉS DE CONTRÔLE DES DOSES MODULÉ PAR IMPULSIONS EN DURÉE
Abstract:
(EN) A substrate processing system for treating a substrate includes a manifold and a plurality of injector assemblies located in a processing chamber. Each of the plurality of injector assemblies is in fluid communication with the manifold and includes a valve including an inlet and an outlet. A dose controller is configured to communicate with the valve in each of the plurality of injector assemblies and adjust a pulse width supplied to the valve in each of the plurality of injector assemblies based on at least one of manufacturing differences between the valves in each of the plurality of injector assemblies and non-uniformities of the valves in each of the plurality of injector assemblies to cause a desired dose to be supplied from the valve in each of the plurality of injector assemblies.
(FR) On décrit un système de traitement de substrat qui comprend un collecteur et une pluralité d'ensembles injecteurs situés dans une chambre de traitement. Chaque ensemble injecteurs est en communication fluidique avec le collecteur et comporte une vanne munie d'une entrée et d'une sortie. Un dispositif de contrôle des doses est conçu pour communiquer avec la vanne dans chaque ensemble injecteurs, et ajuste une largeur d'impulsion appliquée à la vanne dans chaque ensemble injecteurs en fonction de différences de fabrication entre les vannes dans chaque ensemble injecteurs et/ou de non-uniformités des vannes dans chaque ensemble injecteurs pour assurer l'apport d'une dose souhaitée de la vanne à chaque ensemble injecteurs.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)