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1. (WO2019066861) GENERATING AN ASSOCIATION DATASET FOR MANIPULATING A PHOTOMASK PATTERN
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Pub. No.: WO/2019/066861 International Application No.: PCT/US2017/054056
Publication Date: 04.04.2019 International Filing Date: 28.09.2017
IPC:
G03F 1/36 (2012.01) ,H01L 21/033 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
36
Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
033
comprising inorganic layers
Applicants:
INTEL CORPORATION [US/US]; 2200 Mission College Boulevard Santa Clara, California 95054, US
Inventors:
DHANANJAY VINJAMUR, Raghunathan; US
BROCKMAN, Christopher; US
VENKATESAN, Raguraman; US
AGARWAL, Diwakar; US
Agent:
COFIELD, Michael A.; US
PARKER, Wesley E.; US
MARLINK, Jeffrey S.; US
AUYEUNG, Al; US
RASKIN, Vladimir; US
DANSKIN, Timothy A.; US
MOORE, Michael S.; US
STRAUSS, Ryan N.; US
BLAIR, Steven R.; US
HALEVA, Aaron S.; US
MAKI, Nathan R.; US
WANG, Yuke; US
YATES, Steven; US
BERNADICOU, Michael A.; US
BRASK, Justin; US
Priority Data:
Title (EN) GENERATING AN ASSOCIATION DATASET FOR MANIPULATING A PHOTOMASK PATTERN
(FR) GÉNÉRATION D'UN ENSEMBLE DE DONNÉES D'ASSOCIATION POUR MANIPULER UN MOTIF DE PHOTOMASQUE
Abstract:
(EN) Apparatuses, methods and storage medium associated with generating an association dataset for manipulating a photomask pattern are disclosed herein. In embodiments, an apparatus to generate an association dataset for correction of a mask pattern (e.g., an arbitrary mask pattern) to compensate for liabilities predicted by one or more OPC (optical proximity correction) models based on the mask pattern may include a processor to: identify a plurality of evaluation points that correspond to a wafer target pattern that is different than the mask pattern; identify segments of a perimeter of the mask portions of the perimeter of the mask pattern to the evaluation points, respectively, in response to the identification of the segments; wherein the association dataset is based on the correlations.
(FR) La présente invention concerne des appareils, des procédés et un support de données associés à la génération d'un ensemble de données d'association pour manipuler un motif de photomasque. Dans des modes de réalisation, un appareil destiné à générer un ensemble de données d'association pour la correction d'un motif de masque (un motif de masque arbitraire, par exemple) dans le but de pallier les erreurs potientielles prédites par un ou plusieurs modèles OPC (correction de proximité optique) sur la base du motif de masque peut comprendre un processeur pour : identifier une pluralité de points d'évaluation qui correspondent à un motif cible de tranche qui diffère du motif de masque ; respectivement identifier aux points d'évaluation des segments d'un périmètre des parties de masque du périmètre du motif de masque, et ce suite à l'identification des segments. L'ensemble de données d'association est basé sur les corrélations.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)