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1. (WO2019066377) CONDUCTIVE INK COMPRISING DIACETYLENE DIOL MONOMER AND CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING MICROPATTERN BY USING SAME
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Pub. No.: WO/2019/066377 International Application No.: PCT/KR2018/011115
Publication Date: 04.04.2019 International Filing Date: 20.09.2018
IPC:
C09D 11/52 (2014.01) ,G03F 7/20 (2006.01) ,H01B 1/12 (2006.01)
[IPC code unknown for C09D 11/52]
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
1
Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
06
mainly consisting of other non-metallic substances
12
organic substances
Applicants:
한양대학교 산학협력단 INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY [KR/KR]; 서울시 성동구 왕십리로 222 222, Wangsimni-ro Seongdong-gu Seoul 04763, KR
Inventors:
이찬우 LEE, Chan Woo; KR
김종만 KIM, Jong Man; KR
박수민 PARK, Su Min; KR
Agent:
특허법인 이상 E-SANG PATENT & TRADEMARK LAW FIRM; 서울시 서초구 바우뫼로 188, 3층 3F., 188, Baumoe-ro Seocho-gu Seoul 06747, KR
Priority Data:
10-2017-012406626.09.2017KR
Title (EN) CONDUCTIVE INK COMPRISING DIACETYLENE DIOL MONOMER AND CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING MICROPATTERN BY USING SAME
(FR) ENCRE CONDUCTRICE COMPRENANT UN MONOMÈRE DE DIACÉTYLÈNE DIOL ET UN POLYMÈRE CONDUCTEUR, ET PROCÉDÉ POUR LA PRODUCTION D'UN MICRO-MOTIF À L'AIDE DE CELLE-CI
(KO) 다이아세틸렌 다이올 단량체와 전도성 고분자를 포함하는 전도성 잉크 및 이를 이용한 미세 패턴의 제조방법
Abstract:
(EN) Provided are conductive ink comprising a diacetylene diol monomer and a conductive polymer, and a method for producing a micropattern by using the same. The conductive ink comprises a conductive polymer and a diacetylene diol monomer represented by the following Formula (1). [Formula 1] HO-Rn-C≡C-C≡C-Rm-OH. In Formula 1, n and m are independently 1 to 10, R is CRaRb or (CRaRb)xO, Ra and Rb are independently hydrogen or a halogen group, and x is an integer of 1 to 3. In Formula 1, R is CH2, and n and m may be independently an integer of 1 to 4 .
(FR) L'invention concerne une encre conductrice comprenant un monomère de diacétylène diol et un polymère conducteur, et un procédé de production d'un micro-motif à l'aide de celle-ci. L'encre conductrice comprend un polymère conducteur et un monomère de diacétylène diol représenté par la formule suivante (1). [Formule 1] HO-Rn-C≡C-C≡C-Rm-OH. Dans la formule 1, n et m sont indépendamment égaux à 1 à 10, R représente CRaRb ou (CRaRb)xO, Ra et Rb représentent indépendamment un atome d'hydrogène ou un groupe halogène, et x est un nombre entier de 1 à 3. Dans la formule 1, R représente CH2, et n et m peuvent représenter indépendamment un nombre entier de 1 à 4.
(KO) 다이아세틸렌 다이올 단량체와 전도성 고분자를 포함하는 전도성 잉크 및 이를 이용한 미세 패턴의 제조방법을 제공한다. 상기 전도성 잉크는 전도성 고분자와 하기 화학식 1로 표시되는 다이아세틸렌 다이올 단량체를 포함한다. [화학식 1] HO-Rn-C≡C-C≡C-Rm-OH 상기 화학식 1에서, n과 m은 서로에 관계없이 1 내지 10이고, R은 CRaRb 또는 (CRaRb)xO이고, Ra와 Rb는 서로에 관계없이 수소 또는 할로겐기이고, x는 1 내지 3의 정수이다. 상기 화학식 1에서 R은 CH2이고, n과 m은 서로에 관계없이 1 내지 4의 정수일 수 있다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)