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Pub. No.: WO/2019/066013 International Application No.: PCT/JP2018/036399
Publication Date: 04.04.2019 International Filing Date: 28.09.2018
C01B 32/182 (2017.01)
[IPC code unknown for C01B 32/182]
国立研究開発法人科学技術振興機構 JAPAN SCIENCE AND TECHNOLOGY AGENCY [JP/JP]; 埼玉県川口市本町4-1-8 川口センタービル Kawaguchi Center Building, 4-1-8, Honcho, Kawaguchi-shi, Saitama 3320012, JP
齋藤 永宏 SAITO Nagahiro; JP
特許業務法人SSINPAT SSINPAT PATENT FIRM; 東京都品川区西五反田七丁目13番6号 五反田山崎ビル6階 Gotanda Yamazaki Bldg. 6F, 13-6, Nishigotanda 7-chome, Shinagawa-ku, Tokyo 1410031, JP
Priority Data:
(JA) ヘテロ元素含有グラフェン
(EN) The present invention addresses the problem of providing a heteroelement-containing graphene that has a high degree of crystallinity. This heteroelement-containing graphene contains: carbon (C); and, as a heteroelement (X), at least one element selected from the group consisting of nitrogen (N), phosphorous (P), arsenic (As), sulfur (S), boron (B) and silicon (Si). In addition, in selected area electron diffraction, a spot belonging to either the orthorhombic crystal system or the hexagonal crystal system and exhibiting single crystal symmetry is observed..
(FR) L'invention concerne un graphène contenant un hétéroélément ayant un haut degré de cristallinité. Ce graphène contenant un hétéroélément contient : du carbone (C) ; et au moins un élément, en tant qu'hétéroélément (X), choisi dans le groupe constitué par l'azote (N), le phosphore (P), l'arsenic (As), le soufre (S), le bore (B) et le silicium (Si). De plus, dans la diffraction d'électrons d'une zone sélectionnée, on observe une tache qui appartient soit au système cristallin orthorhombique soit au système cristallin hexagonal et qui a une symétrie monocristalline.
(JA) 課題は、結晶性の高いヘテロ元素含有グラフェンを提供することである。ここに開示されるヘテロ元素含有グラフェンは、炭素(C)と、ヘテロ元素(X)として窒素(N)、リン(P)、ヒ素(As)、イオウ(S)、ホウ素(B)、およびケイ素(Si)からなる群から選択される少なくとも1種の元素と、を含む。そして、制限視野電子回折において、直方晶系および六方晶系のいずれかに属し、単結晶の対称性を備えるスポットが観測される。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)