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1. (WO2019066000) COMPOSITION FOR LITHOGRAPHY, PATTERN FORMATION METHOD AND COMPOUND
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/066000 International Application No.: PCT/JP2018/036344
Publication Date: 04.04.2019 International Filing Date: 28.09.2018
IPC:
G03F 7/004 (2006.01) ,C07F 11/00 (2006.01) ,G03F 7/029 (2006.01) ,G03F 7/038 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
11
Compounds containing elements of the 6th Group of the Periodic System
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
029
Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
学校法人関西大学 THE SCHOOL CORPORATION KANSAI UNIVERSITY [JP/JP]; 大阪府吹田市山手町3丁目3番35号 3-3-35, Yamate-cho, Suita-shi, Osaka 5648680, JP
三菱瓦斯化学株式会社 MITSUBISHI GAS CHEMICAL COMPANY, INC. [JP/JP]; 東京都千代田区丸の内二丁目5番2号 5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008324, JP
Inventors:
工藤 宏人 KUDO, Hiroto; JP
越後 雅敏 ECHIGO, Masatoshi; JP
佐藤 隆 SATO, Takashi; JP
Agent:
稲葉 良幸 INABA, Yoshiyuki; JP
大貫 敏史 ONUKI, Toshifumi; JP
内藤 和彦 NAITO, Kazuhiko; JP
Priority Data:
2017-18934029.09.2017JP
Title (EN) COMPOSITION FOR LITHOGRAPHY, PATTERN FORMATION METHOD AND COMPOUND
(FR) COMPOSITION POUR LITHOGRAPHIE, PROCÉDÉ DE FORMATION DE MOTIF ET COMPOSÉ
(JA) リソグラフィー用組成物、パターン形成方法、及び化合物
Abstract:
(EN) A composition for lithography which comprises a compound represented by formula (1). [LxTe(OR1)y] (1) [wherein: L represents a ligand other than OR1; R1 represents a hydrogen atom, an optionally substituted linear alkyl group having 1-20 carbon atoms, an optionally substituted branched or cyclic alkyl group having 3-20 carbon atoms, an optionally substituted aryl group having 6-20 carbon atoms, or an optionally substituted alkenyl group having 2-20 carbon atoms; x is an integer of 0-6; and y is an integer of 0-6, provided that x+y is 1-6, and when x is 2 or more, L's may be the same or different, and when y is 2 or more, R1's may be the same or different].
(FR) L'invention concerne une composition pour lithographie qui comprend un composé représenté par la formule (1). [LxTe(OR1)y] (1) [dans la formule : L représente un ligand autre que OR1 ; R1 représente un atome d'hydrogène, un groupe alkyle linéaire éventuellement substitué ayant de 1 à 20 atomes de carbone, un groupe alkyle ramifié ou cyclique éventuellement substitué ayant de 3 à 20 atomes de carbone, un groupe aryle éventuellement substitué ayant de 6 à 20 atomes de carbone, ou un groupe alcényle éventuellement substitué ayant de 2 à 20 atomes de carbone ; x est un nombre entier compris entre 0 et 6 ; et y est un nombre entier compris entre 0 et 6, à condition que x + y soit compris entre 1 et 6, et que lorsque x est supérieur ou égal à 2, L puisse être identique ou différent, et que lorsque y est supérieur ou égal à 2, R1 puisse être identique ou différent].
(JA) 下記式(1)で表わされる化合物を含有するリソグラフィー用組成物。 [LTe(OR] (1) (上記式(1)中、Lは、OR以外の配位子であり、Rは、水素原子、置換又は無置換の炭素数1~20の直鎖状又は炭素数3~20の分岐状若しくは環状のアルキル基、置換又は無置換の炭素数6~20のアリール基、及び置換又は無置換の炭素数2~20のアルケニル基のいずれかであり、xは、0~6の整数であり、yは、0~6の整数であり、xとyの合計は、1~6であり、xが2以上である場合、複数のLは同一でも異なっていてもよく、yが2以上である場合、複数のRは同一でも異なっていてもよい。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)