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1. (WO2019065840) STRAIN GAUGE
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Pub. No.: WO/2019/065840 International Application No.: PCT/JP2018/035938
Publication Date: 04.04.2019 International Filing Date: 27.09.2018
IPC:
G01B 7/16 (2006.01)
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
7
Measuring arrangements characterised by the use of electric or magnetic means
16
for measuring the deformation in a solid, e.g. by resistance strain gauge
Applicants:
ミネベアミツミ株式会社 MINEBEA MITSUMI INC. [JP/JP]; 長野県北佐久郡御代田町大字御代田4106-73 4106-73 Oaza Miyota, Miyota-machi, Kitasaku-gun, Nagano 3890293, JP
Inventors:
浅川 寿昭 ASAKAWA, Toshiaki; JP
湯口 昭代 YUGUCHI, Akiyo; JP
相澤 祐汰 AIZAWA, Yuta; JP
種田 翔太 TANEDA, Syota; JP
Agent:
伊東 忠重 ITOH, Tadashige; JP
伊東 忠彦 ITOH, Tadahiko; JP
Priority Data:
2017-19182229.09.2017JP
Title (EN) STRAIN GAUGE
(FR) JAUGE EXTENSOMÉTRIQUE
(JA) ひずみゲージ
Abstract:
(EN) This strain gauge includes: a flexible base material; and a resistor formed on the base material from a material containing chromium and/or nickel. The surface unevenness on one surface of the base material is no more than 15nm, and the film thickness of the resistor is at least 0.05μm.
(FR) La jauge extensométrique selon l’invention possède: un substrat flexible; et une résistance formée sur le substrat à partir d’un matériau contenant du chrome et/ou du nickel. La rugosité superficielle d'une face de substrat est inférieure ou égale à 15 nm, et l’épaisseur de film de la résistance est supérieure ou égale à 0,05 μm.
(JA) 本ひずみゲージは、可撓性を有する基材と、前記基材上に、クロムとニッケルの少なくとも一方を含む材料から形成された抵抗体と、を有し、前記基材の一方の面の表面凹凸が15nm以下であり、前記抵抗体の膜厚が0.05μm以上である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)