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1. (WO2019065819) COMPOSITION FOR FORMING TEMPORARY BONDING LAYER, AND TEMPORARY BONDING LAYER
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/065819 International Application No.: PCT/JP2018/035882
Publication Date: 04.04.2019 International Filing Date: 27.09.2018
IPC:
C09J 179/08 (2006.01) ,C08G 73/10 (2006.01) ,C09J 11/06 (2006.01) ,H05K 3/00 (2006.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
179
Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/-C09J177/263
04
Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
08
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
73
Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen or carbon, not provided for in groups C08G12/-C08G71/238
06
Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
10
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
11
Features of adhesives not provided for in group C09J9/76
02
Non-macromolecular additives
06
organic
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3
Apparatus or processes for manufacturing printed circuits
Applicants:
日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP/JP]; 東京都中央区日本橋二丁目5番1号 5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo 1036119, JP
Inventors:
葉 鎮嘉 YE ChenJia; TW
江原 和也 EBARA Kazuya; JP
進藤 和也 SHINDO Kazuya; JP
Agent:
特許業務法人英明国際特許事務所 PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE; 東京都中央区銀座二丁目16番12号 銀座大塚ビル2階 GINZA OHTSUKA Bldg. 2F, 16-12, Ginza 2-chome, Chuo-ku, Tokyo 1040061, JP
Priority Data:
2017-18578827.09.2017JP
Title (EN) COMPOSITION FOR FORMING TEMPORARY BONDING LAYER, AND TEMPORARY BONDING LAYER
(FR) COMPOSITION POUR FORMER UNE COUCHE DE LIAISON TEMPORAIRE, ET COUCHE DE LIAISON TEMPORAIRE
(JA) 仮接着層形成用組成物及び仮接着層
Abstract:
(EN) A composition for forming a temporary bonding layer, which is used for the purpose of forming a temporary bonding layer that affixes a resin substrate onto a base material, and which contains (A) a polyamic acid of formula (P1), (B) a polyamic acid of formula (P2), (C) a silane coupling agent having an amino group or the like, and (D) a mixed solvent that contains an amide-based solvent or the like. (In formula (P1), X1 represents a divalent aromatic group having two carboxy groups and an ester bond, or the like; and Y1 represents a divalent aromatic group having an ester bond, or the like.) (In formula (P2), X2 represents a divalent aromatic group having two carboxy groups and an ether bond, or the like; and Y2 represents a divalent aromatic group having an ether bond, or the like.)
(FR) La présente invention concerne une composition destinée à former une couche de liaison temporaire, qui est utilisée dans le but de former une couche de liaison temporaire qui fixe un substrat de résine sur un matériau de base, et qui contient (A) un acide polyamique de formule (P1), (B) un acide polyamique de formule (P2), (C) un agent de couplage au silane ayant un groupe amino ou similaire, et (D) un solvant mixte qui contient un solvant à base d'amide ou similaire. (Dans la formule (P1), X1 représente un groupe aromatique divalent ayant deux groupes carboxy et une liaison ester, ou similaire ; et Y1 représente un groupe aromatique divalent ayant une liaison ester, ou similaire.) (Dans la formule (P2), X2 représente un groupe aromatique divalent ayant deux groupes carboxy et une liaison éther, ou similaire ; et Y2 représente un groupe aromatique divalent ayant une liaison éther, ou similaire.)
(JA) 樹脂基板を基体上に固定する仮接着層を形成するための組成物であって、(A)式(P1)のポリアミック酸、(B)式(P2)のポリアミック酸、(C)アミノ基等を有するシランカップリング剤、(D)アミド系溶媒等を含む混合溶媒を含む仮接着層形成用組成物。(X1は、2つのカルボキシ基及びエステル結合を有する2価の芳香族基等を表し、Y1は、エステル結合を有する2価の芳香族基等を表す。) (X2は、2つのカルボキシ基及びエーテル結合を有する2価の芳香族基等を表し、Y2は、エーテル結合を有する2価の芳香族基等を表す。)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)