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1. (WO2019065789) PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, BLACK MATRIX AND IMAGE DISPLAY DEVICE
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Pub. No.: WO/2019/065789 International Application No.: PCT/JP2018/035818
Publication Date: 04.04.2019 International Filing Date: 26.09.2018
IPC:
G03F 7/031 (2006.01) ,C08F 2/44 (2006.01) ,C08F 2/50 (2006.01) ,C08F 290/06 (2006.01) ,G02B 5/20 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/027 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
031
Organic compounds not covered by group G03F7/02967
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
44
Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
290
Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
02
on to polymers modified by introduction of unsaturated end groups
06
Polymers provided for in subclass C08G52
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Applicants:
三菱ケミカル株式会社 MITSUBISHI CHEMICAL CORPORATION [JP/JP]; 東京都千代田区丸の内一丁目1番1号 1-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008251, JP
Inventors:
植松 卓也 UEMATSU Takuya; JP
東 直人 AZUMA Naoto; JP
Agent:
田▲崎▼ 聡 TAZAKI Akira; JP
伏見 俊介 FUSHIMI Shunsuke; JP
大浪 一徳 ONAMI Kazunori; JP
Priority Data:
2017-18613827.09.2017JP
2017-23915914.12.2017JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, BLACK MATRIX AND IMAGE DISPLAY DEVICE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE, PRODUIT DURCI, MATRICE NOIRE ET DISPOSITIF D’AFFICHAGE D’IMAGE
(JA) 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
Abstract:
(EN) Provided is a high-resistance photosensitive resin composition having excellent light-blocking properties and insulation properties. This photosensitive resin composition contains (a) an alkali-soluble resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator and (d) a coloring material, and is such that the photopolymerization initiator (c) contains a photopolymerization initiator (c1) represented by general formula (1), and the coloring material (d) contains high-resistance carbon black (d1). (In formula (1), R1, R2 and R3 may be the same as, or different from, each other and each denote an optionally substituted alkyl group or the like, R4 denotes an optionally substituted alkyl group or the like, R5 denotes an optionally substituted alkyl group or the like, A denotes an oxygen atom or a sulfur atom, m is an integer between 0 and 4, n is an integer between 0 and 4 and p is an integer between 0 and 4. The aromatic rings included in formula (1) may include fused rings, but the number of rings included in said fused rings is 2 or less.)
(FR) L'invention concerne une composition de résine photosensible à haute résistance ayant d'excellentes propriétés de blocage de lumière et d'isolation. Cette composition de résine photosensible contient (a) une résine soluble dans les alcalis, (b) un monomère photopolymérisable, (c) un amorceur de photopolymérisation et (d) un matériau colorant, et elle est telle que l'amorceur de photopolymérisation (c) contient un amorceur de photopolymérisation (c1) représenté par la formule générale (1) et que le matériau colorant (d) contient du noir de carbone à haute résistance (d1). (Dans la formule (1), R1, R2 et R3 peuvent être identiques ou différents les uns des autres et ils représentent chacun un groupe alkyle éventuellement substitué ou un groupe similaire, R4 représente un groupe alkyle éventuellement substitué ou un groupe similaire, R5 représente un groupe alkyle éventuellement substitué ou un groupe similaire, A représente un atome d'oxygène ou un atome de soufre, m est un nombre entier compris entre 0 et 4, n est un nombre entier compris entre 0 et 4 et p est un nombre entier compris entre 0 et 4. Les noyaux aromatiques inclus dans la formule (1) peuvent comprendre des noyaux fusionnés, mais le nombre de noyaux inclus dans lesdits noyaux fusionnés est inférieur ou égal à 2.)
(JA) 遮光性及び絶縁性に優れた高抵抗な感光性樹脂組成物を提供する。本発明の感光性樹脂組成物は、(a)アルカリ可溶性樹脂、(b)光重合性モノマー、(c)光重合開始剤、及び(d)色材を含み、前記(c)光重合開始剤が、下記一般式(1)で表される光重合開始剤(c1)を含有し、前記(d)色材が、高抵抗カーボンブラック(d1)を含有する。(上記式(1)中、R1、R2及びR3は、それぞれ同一又は異なって、置換基を有していてもよいアルキル基等を、R4は置換基を有していてもよいアルキル基等を、R5は置換基を有していてもよいアルキル基等を、Aは酸素原子又は硫黄原子を、mは0~4の整数を、nは0~4の整数を、pは0~4の整数を表す。式(1)中に含まれる芳香族環は縮合環を含んでいてもよいが、該縮合環に含まれる環は2個以下である。)
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African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)