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1. (WO2019065686) PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING PHOTOSPACER, METHOD FOR FORMING PHOTOSPACER, SUBSTRATE EQUIPPED WITH PHOTOSPACER, AND COLOUR FILTER
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Pub. No.: WO/2019/065686 International Application No.: PCT/JP2018/035579
Publication Date: 04.04.2019 International Filing Date: 26.09.2018
IPC:
G02B 5/20 (2006.01) ,G02F 1/1339 (2006.01) ,G03F 7/027 (2006.01) ,G03F 7/038 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1339
Gaskets; Spacers; Sealing of the cell
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
Applicants:
大阪有機化学工業株式会社 OSAKA ORGANIC CHEMICAL INDUSTRY LTD. [JP/JP]; 大阪府大阪市中央区安土町1丁目7番20号 1-7-20, Azuchi-machi, Chuo-ku, Osaka-shi, Osaka 5410052, JP
Inventors:
杉山 大 SUGIYAMA, Dai; JP
椿 幸樹 TSUBAKI, Koki; JP
百本 恵 HYAKUMOTO, Megumi; JP
中野 順弘 NAKANO, Nobuhiro; JP
Agent:
稲葉 良幸 INABA, Yoshiyuki; JP
大貫 敏史 ONUKI, Toshifumi; JP
Priority Data:
2017-18497326.09.2017JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING PHOTOSPACER, METHOD FOR FORMING PHOTOSPACER, SUBSTRATE EQUIPPED WITH PHOTOSPACER, AND COLOUR FILTER
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE POUR FORMER UN PHOTO-ESPACEUR, PROCÉDÉ DE FORMATION D'UN PHOTO-ESPACEUR, SUBSTRAT ÉQUIPÉ D'UN PHOTO-ESPACEUR, ET FILTRE COLORÉ
(JA) フォトスペーサ形成用感光性樹脂組成物、フォトスペーサの形成方法、フォトスペーサ付基板、及び、カラーフィルタ
Abstract:
(EN) This photosensitive resin composition for forming a photospacer includes an alkali-soluble resin, and an oligomer having a weight average molecular weight of 1000 or higher. The mass ratio (O/P ratio) of the oligomer (O) to the alkali-soluble resin (P) is 0.4-1.0.
(FR) Cette composition de résine photosensible pour former un photo-espaceur comprend une résine soluble dans les alcalis, et un oligomère ayant un poids moléculaire moyen en poids de 1000 ou plus. Le rapport massique (rapport O/P) de l'oligomère (O) à la résine soluble dans les alcalis (P) est de 0,4-1,0.
(JA) アルカリ可溶性樹脂と、重量平均分子量が1000以上のオリゴマーと、を含み、前記アルカリ可溶性樹脂〔P〕と前記オリゴマー〔O〕との質量比〔O/P比〕が、0.4~1.0であるフォトスペーサ形成用感光性樹脂組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)