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1. (WO2019065522) POLYIMIDE RESIN, POLYIMIDE VARNISH AND POLYIMIDE FILM
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Pub. No.: WO/2019/065522 International Application No.: PCT/JP2018/035126
Publication Date: 04.04.2019 International Filing Date: 21.09.2018
IPC:
C08G 73/10 (2006.01) ,C08K 5/00 (2006.01) ,C08L 79/08 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
73
Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen or carbon, not provided for in groups C08G12/-C08G71/238
06
Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule; Polyhydrazides; Polyamide acids or similar polyimide precursors
10
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
K
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5
Use of organic ingredients
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
79
Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08L61/-C08L77/259
04
Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
08
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Applicants:
三菱瓦斯化学株式会社 MITSUBISHI GAS CHEMICAL COMPANY, INC. [JP/JP]; 東京都千代田区丸の内二丁目5番2号 5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008324, JP
Inventors:
安孫子 洋平 ABIKO, Yohei; JP
佐藤 紗恵子 SATO, Saeko; JP
大東 葵 DAITO, Aoi; JP
末永 修也 SUENAGA, Shuya; JP
Agent:
大谷 保 OHTANI, Tamotsu; JP
Priority Data:
2017-19190929.09.2017JP
Title (EN) POLYIMIDE RESIN, POLYIMIDE VARNISH AND POLYIMIDE FILM
(FR) RÉSINE POLYIMIDE, VERNIS DE POLYIMIDE ET FILM DE POLYIMIDE
(JA) ポリイミド樹脂、ポリイミドワニス及びポリイミドフィルム
Abstract:
(EN) This polyimide resin contains constituent units A derived from a tetracarboxylic acid dianhydride and constituent units B derived from a diamine, wherein: constituent units A include constituent units (A-1) derived from a compound represented by formula (a-1), constituent units B include constituent units (B-1) derived from a compound represented by formula (b-1) and constituent units (B-2) derived from a compound represented by formula (b-2); the proportion of constituent units (A-1) is 50 mol% or more of constituent units A; the proportion of constituent units (B-1) is 45-85 mol% of constituent units B; and the proportion of constituent units (B-2) is 15-55 mol% of constituent units B. (In formula (b-2), the R groups each independently represent a hydrogen atom, a fluorine atom or a methyl group.)
(FR) La présente invention concerne une résine polyimide contenant des motifs constitutifs A dérivés d'un dianhydride d'acide tétracarboxylique et des motifs constitutifs B dérivés d'une diamine, les motifs constitutifs A comprenant des motifs constitutifs (A-1) dérivés d'un composé représenté par la formule (a-1), les motifs constitutifs B comprenant des motifs constitutifs (B-1) dérivés d'un composé représenté par la formule (b-1) et des motifs constitutifs (B-2) dérivés d'un composé représenté par la formule (b-2) ; la proportion de motifs constitutifs (A-1) est d'au moins 50 % en moles des motifs constitutifs A ; la proportion de motifs constitutifs (B-1) va de 45 à 85 % en moles des motifs constitutifs B ; et la proportion de motifs constitutifs (B-2) va de 15 à 55 % en moles des motifs constitutifs B. (Dans la formule (b-2), les groupes R représentent chacun indépendamment un atome d'hydrogène, un atome de fluor ou un groupe méthyle.)
(JA) テトラカルボン酸二無水物に由来する構成単位Aと、ジアミンに由来する構成単位Bとを含むポリイミド樹脂であって、構成単位Aが下記式(a-1)で表される化合物に由来する構成単位(A-1)を含み、構成単位Bが下記式(b-1)で表される化合物に由来する構成単位(B-1)及び下記式(b-2)で表される化合物に由来する構成単位(B-2)を含み、構成単位A中における構成単位(A-1)の比率が50モル%以上であり、構成単位B中における構成単位(B-1)の比率が45モル%以上85モル%以下であり、構成単位B中における構成単位(B-2)の比率が15モル%以上55モル%以下である、ポリイミド樹脂。 (式(b-2)中、Rはそれぞれ独立して、水素原子、フッ素原子又はメチル基を表わす。)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)