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1. (WO2019065262) POSITIVE RADIOSENSITIVE RESIN COMPOSITION
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Pub. No.: WO/2019/065262 International Application No.: PCT/JP2018/033932
Publication Date: 04.04.2019 International Filing Date: 13.09.2018
IPC:
G03F 7/023 (2006.01) ,G02F 1/1333 (2006.01) ,G03F 7/004 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
022
Quinonediazides
023
Macromolecular quinonediazides; Macromolecular additives, e.g. binders
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
Applicants:
日本ゼオン株式会社 ZEON CORPORATION [JP/JP]; 東京都千代田区丸の内一丁目6番2号 6-2, Marunouchi 1-chome, Chiyoda-ku Tokyo 1008246, JP
Inventors:
櫻井 隆覚 SAKURAI Takaaki; JP
Agent:
杉村 憲司 SUGIMURA Kenji; JP
Priority Data:
2017-19028829.09.2017JP
Title (EN) POSITIVE RADIOSENSITIVE RESIN COMPOSITION
(FR) COMPOSITION DE RÉSINE RADIOSENSIBLE POSITIVE
(JA) ポジ型感放射線性樹脂組成物
Abstract:
(EN) Provided is a positive radiosensitive resin composition which can form patterns having excellent adhesion during development, and which can form resin films having outstanding chemical resistance, even when subjected to heat treatment at low temperatures. This positive radiosensitive resin composition contains: an alkali-soluble resin; a first acid-forming agent which generates carboxylic acid when irradiated with radiation; a second acid-forming agent which generates sulfonic acid when irradiated with radiation; and a fluorine-containing phenolic compound.
(FR) L'invention concerne une composition de résine radiosensible positive qui peut former des motifs ayant une excellente adhérence pendant le développement, et qui peut former des films de résine ayant une résistance chimique remarquable, même lorsqu'ils sont soumis à un traitement thermique à basse température. Cette composition de résine radiosensible positive contient : une résine soluble dans les alcalis; un premier agent de formation d'acide qui génère de l'acide carboxylique lorsqu'il est irradié par un rayonnement; un second agent de formation d'acide qui génère de l'acide sulfonique lorsqu'il est irradié par un rayonnement; et un composé phénolique contenant du fluor.
(JA) 本発明は、現像密着性に優れるパターンを形成可能であり、且つ、低温で熱処理した場合であっても耐薬品性に優れる樹脂膜を形成可能なポジ型感放射線性樹脂組成物を提供する。本発明のポジ型感放射線性樹脂組成物は、アルカリ可溶性樹脂と、放射線が照射されるとカルボン酸を生成する第一酸発生剤と、放射線が照射されるとスルホン酸を生成する第二酸発生剤と、フッ素含有フェノール性化合物とを含有する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)