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1. (WO2019065224) PATTERN-DRAWING DEVICE
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Pub. No.: WO/2019/065224 International Application No.: PCT/JP2018/033703
Publication Date: 04.04.2019 International Filing Date: 11.09.2018
IPC:
G03F 7/20 (2006.01) ,G02B 26/12 (2006.01) ,G02F 1/33 (2006.01) ,G02F 1/37 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26
Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
08
for controlling the direction of light
10
Scanning systems
12
using multifaceted mirrors
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
29
for the control of the position or the direction of light beams, i.e. deflection
33
Acousto-optical deflection devices
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
35
Non-linear optics
37
for second-harmonic generation
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
加藤正紀 KATO Masaki; JP
中山修一 NAKAYAMA Shuichi; JP
鬼頭義昭 KITO Yoshiaki; JP
鈴木智也 SUZUKI Tomonari; JP
堀正和 HORI Masakazu; JP
林田洋祐 HAYASHIDA Yosuke; JP
Agent:
千葉剛宏 CHIBA Yoshihiro; JP
宮寺利幸 MIYADERA Toshiyuki; JP
千馬隆之 SENBA Takayuki; JP
仲宗根康晴 NAKASONE Yasuharu; JP
坂井志郎 SAKAI Shiro; JP
関口亨祐 SEKIGUCHI Kosuke; JP
Priority Data:
2017-18435726.09.2017JP
2017-18436026.09.2017JP
2017-18436326.09.2017JP
Title (EN) PATTERN-DRAWING DEVICE
(FR) DISPOSITIF DE TRAÇAGE DE MOTIF
(JA) パターン描画装置
Abstract:
(EN) A pattern-drawing device (EX) is provided with a drawing unit (Un) for scanning a spot light (SP) of a drawing beam (LBn) in the main scan direction and drawing a pattern, and a movement mechanism for moving a substrate (P) and the drawing unit (Un) in the sub-scan direction relative to each other. The pattern-drawing device (EX) alternatively switches, using an optical element (OSn) for selection, between a first state for causing a beam (LB) from a light source device (LS) to be deflected at a prescribed deflection angle by a change of optical characteristics due to an electric signal and causing the deflected beam to enter the drawing unit (Un) as the drawing beam (LBn) and a second state for not causing the deflected beam to enter the drawing unit (Un), and, in order to cause the spot light (SP) projected from the drawing unit (Un) to be shifted in the sub-scan direction by a prescribed amount when in the first state, controls the electric signal so that the deflection angle by the optical element (OSn) for selection changes, and corrects a change of intensity of the spot light (SP) which occurs due to a change of the deflection angle by the optical element (OSn) for selection, in accordance with the optical characteristics of the optical element (OSn) for selection.
(FR) La présente invention concerne un dispositif de traçage de motif (EX) pourvu d'une unité de traçage (un) permettant de balayer une lumière dirigée (SP) d'un faisceau de traçage (LBn) dans la direction de balayage principal et de tracer un motif, et d'un mécanisme de déplacement permettant de déplacer un substrat (P) et l'unité de traçage (Un) dans la direction de sous-balayage l'un par rapport à l'autre. Le dispositif de traçage de motif (EX) passe alternativement, à l'aide d'un élément optique (OSn) de sélection, d'un premier état permettant d'amener un faisceau (LB) d'un dispositif de source de lumière (LS) à dévier selon un angle de déviation prescrit par un changement de caractéristiques optiques provoqué par un signal électrique et d'amener le faisceau dévié à entrer dans l'unité de traçage (Un) en tant que faisceau de traçage (LBn), à un second état permettant de ne pas amener le faisceau dévié à entrer dans l'unité de traçage (Un). Afin d'amener la lumière dirigée (SP) projetée depuis l'unité de traçage (Un) à dévier dans la direction de sous-balayage d'une quantité prescrite lorsqu'elle est dans le premier état, le dispositif de traçage de motif (EX) commande le signal électrique de sorte que l'angle de déviation par l'élément optique (OSn) de sélection change, et corrige un changement d'intensité de la lumière dirigée (SP) qui se produit en raison d'un changement de l'angle de déviation par l'élément optique (OSn) de sélection, en fonction des caractéristiques optiques de l'élément optique (OSn) de sélection.
(JA) パターン描画装置(EX)は、描画ビーム(LBn)のスポット光(SP)を主走査方向に走査してパターンを描画する描画ユニット(Un)と、基板(P)と描画ユニット(Un)とを副走査方向に相対移動させる為の移動機構とを備える。パターン描画装置(EX)は、選択用光学素子(OSn)を用いて、光源装置(LS)からのビーム(LB)を、電気信号による光学特性の変化によって所定の偏向角度で偏向させて描画ビーム(LBn)として描画ユニット(Un)に入射させる第1の状態と、描画ユニット(Un)に非入射とする第2の状態とに択一的に切り換え、第1の状態のときに、描画ユニット(Un)から投射されるスポット光(SP)を副走査方向に所定の量だけシフトさせる為に、選択用光学素子(OSn)による偏向角度を変化させるように電気信号を制御し、選択用光学素子(OSn)による偏向角度の変化に伴って生じるスポット光(SP)の強度変化を、選択用光学素子(OSn)の光学特性に応じて補正する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)