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1. (WO2019065129) PHOTOSENSITIVE RESIN COMPOSITION, FLEXOGRAPHIC PRINTING PLATE PRECURSOR, AND FLEXOGRAPHIC PRINTING PLATE
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Pub. No.: WO/2019/065129 International Application No.: PCT/JP2018/032855
Publication Date: 04.04.2019 International Filing Date: 05.09.2018
Chapter 2 Demand Filed: 05.02.2019
IPC:
G03F 7/027 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/032 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
田代 宏 TASHIRO Hiroshi; JP
Agent:
渡辺 望稔 WATANABE Mochitoshi; JP
伊東 秀明 ITOH Hideaki; JP
三橋 史生 MITSUHASHI Fumio; JP
Priority Data:
2017-18667227.09.2017JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION, FLEXOGRAPHIC PRINTING PLATE PRECURSOR, AND FLEXOGRAPHIC PRINTING PLATE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE, PRÉCURSEUR DE PLAQUE D'IMPRESSION FLEXOGRAPHIQUE ET PLAQUE D'IMPRESSION FLEXOGRAPHIQUE
(JA) 感光性樹脂組成物、フレキソ印刷版原版およびフレキソ印刷版
Abstract:
(EN) The present invention addresses the problem of providing: a photosensitive resin composition having excellent handling performance and printing durability when used to produce a flexographic printing plate; a flexographic printing plate precursor; and a flexographic printing plate in which the photosensitive resin composition is used. This photosensitive resin composition contains a rubber, a photopolymerizable monomer, and a photopolymerization initiator. The photopolymerizable monomer contains a polymerizable heterocyclic compound having an ethylenic unsaturated bond and a heterocycle.
(FR) La présente invention aborde le problème de la réalisation : d'une composition de résine photosensible ayant d'excellentes performances de manipulation et une excellente durabilité d'impression lorsqu'elle est utilisée pour produire une plaque d'impression flexographique; d'un précurseur de plaque d'impression flexographique; et d'une plaque d'impression flexographique dans laquelle la composition de résine photosensible est utilisée. La solution selon l'invention porte sur une composition de résine photosensible qui contient un caoutchouc, un monomère photopolymérisable et un initiateur de photopolymérisation. Le monomère photopolymérisable contient un composé hétérocyclique polymérisable ayant une liaison insaturée éthylénique et un hétérocycle.
(JA) 本発明は、フレキソ印刷版としたときにハンドリング性および耐刷性に優れる感光性樹脂組成物、ならびに、上記感光性樹脂組成物を用いたフレキソ印刷版原版およびフレキソ印刷版を提供すること課題とする。本発明の感光性樹脂組成物は、ゴム、光重合性モノマー、および、光重合開始剤を含有し、光重合性モノマーが、エチレン性不飽和結合および複素環を有する重合性複素環化合物を含有する、感光性樹脂組成物である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)