Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019065020) GAS BARRIER FILM
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/065020 International Application No.: PCT/JP2018/031245
Publication Date: 04.04.2019 International Filing Date: 23.08.2018
IPC:
B32B 9/00 (2006.01) ,C23C 16/42 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
42
Silicides
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
望月 佳彦 MOCHIZUKI Yoshihiko; JP
Agent:
中島 順子 NAKASHIMA Junko; JP
米倉 潤造 YONEKURA Junzo; JP
村上 泰規 MURAKAMI Yasunori; JP
Priority Data:
2017-18693027.09.2017JP
Title (EN) GAS BARRIER FILM
(FR) FILM BARRIÈRE AUX GAZ
(JA) ガスバリアフィルム
Abstract:
(EN) The present invention addresses the problem of providing a gas barrier film having excellent bending resistance, transparency, productivity and the like and also having sufficient gas barrier performance and high-temperature/high-humidity resistance. The gas barrier film has at least one set of a combination of an inorganic layer and a mixed layer, wherein the inorganic layer contains silicon nitride and has a thickness of 2 to 15 nm, the mixed layer contains the component for the inorganic layer and also contains a component for a layer corresponding to a surface on which the inorganic layer is formed, and has a thickness of 2 to 25 nm, and the N/Si atom ratio in the inorganic layer is 0.7 to 0.97.
(FR) La présente invention consiste à fournir un film barrière aux gaz comprenant une résistance à la flexion, une transparence, une productivité et similaires excellentes, et comprenant également une efficacité de barrière aux gaz et une résistance aux températures élevées/à l'humidité élevée suffisantes. Le film barrière aux gaz comprend au moins un ensemble d'une association d'une couche inorganique et d'une couche mixte, la couche inorganique contenant du nitrure de silicium et comprenant une épaisseur de 2 à 15 nm, la couche mixte contenant le constituant destiné à la couche inorganique et contenant également un constituant destiné à une couche correspondant à une surface sur laquelle la couche inorganique est formée, et comprenant une épaisseur de 2 à 25 nm, et le rapport atomique N/Si dans la couche inorganique étant de 0,7 à 0,97.
(JA) 耐屈曲性、透明性および生産性等に優れ、さらに、十分なガスバリア性および高温高湿耐性も有するガスバリアフィルムの提供を課題とする。ガスバリアフィルムは、窒化ケイ素を含有し、厚さが2~15nmである無機層と、無機層の成分および無機層の形成面になる層の成分を含有し、厚さが2~25nmである混合層との組み合わせを、少なくとも1組、有し、無機層のN/Si原子比が0.7~0.97である。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)