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1. (WO2019064993) STRUCTURE, COMPOSITION FOR FORMING PARTITION WALLS, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
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Pub. No.: WO/2019/064993 International Application No.: PCT/JP2018/030730
Publication Date: 04.04.2019 International Filing Date: 21.08.2018
IPC:
G02B 5/20 (2006.01) ,C09D 183/04 (2006.01) ,H01L 31/10 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
183
Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
04
Polysiloxanes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
08
in which radiation controls flow of current through the device, e.g. photoresistors
10
characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
大河原 昂広 OKAWARA Takahiro; JP
Agent:
中島 順子 NAKASHIMA Junko; JP
米倉 潤造 YONEKURA Junzo; JP
村上 泰規 MURAKAMI Yasunori; JP
Priority Data:
2017-18429326.09.2017JP
Title (EN) STRUCTURE, COMPOSITION FOR FORMING PARTITION WALLS, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
(FR) STRUCTURE, COMPOSITION DE FORMATION DE PAROIS DE SÉPARATION, ÉLÉMENT D'IMAGERIE À SEMI-CONDUCTEURS ET DISPOSITIF D'AFFICHAGE D'IMAGE
(JA) 構造体、隔壁形成用組成物、固体撮像素子および画像表示装置
Abstract:
(EN) Provided is a structure which has partition walls having excellent smoothness and a low refractive index. Also, provided are a composition which is for forming partition walls and which is used in the structure, a solid-state imaging element including the structure, and an image display device. A structure 100 has a support 1, partition walls 2 provided on the support 1, and pixels 4 provided in regions separated by the partition walls, wherein the partition walls 2 are formed using a composition containing a cage siloxane compound. The cage siloxane compound preferably has a partial structure represented by "(*-SiO1.5)n". In the formula, * represents a linking bond, and n represents an integer of 6-16.
(FR) L'invention concerne une structure qui comporte des parois de séparation ayant un excellent lissé et un faible indice de réfraction. L'invention concerne également une composition qui est destinée à former des parois de séparation et qui est utilisée dans la structure, un élément d'imagerie à semi-conducteurs comprenant la structure, et un dispositif d'affichage d'image. La structure (100) comporte un support (1), des parois de séparation (2) disposées sur le support (1), et des pixels (4) disposés dans des régions séparées par les parois de séparation, les parois de séparation (2) étant formées à l'aide d'une composition contenant un composé de siloxane de cage. Le composé de siloxane de cage a de préférence une structure partielle représentée par « (*-SiO1.5)n ». Dans la formule, * représente une liaison et n représente un nombre entier compris entre 6 et 16.
(JA) 屈折率が小さく、平滑性に優れた隔壁を有する構造体を提供する。また、この構造体に用いられる隔壁形成用組成物、構造体を含む固体撮像素子および画像表示装置を提供する。構造体100は、支持体1と、支持体1上に設けられた隔壁2と、隔壁で区切られた領域に設けられた画素4と、を有し、隔壁2がかご型シロキサン化合物を含む組成物を用いて形成された隔壁である。かご型シロキサン化合物は、「(*-SiO1.5」で表される部分構造を有する化合物であることが好ましい。式中、*は連結手を表し、nは6~16の整数を表す。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)