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1. (WO2019064890) SUBSTRATE TRANSPORT DEVICE AND SUBSTRATE CARRYING UNIT ROTATION AXIS SEARCH METHOD
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Pub. No.: WO/2019/064890 International Application No.: PCT/JP2018/028451
Publication Date: 04.04.2019 International Filing Date: 30.07.2018
IPC:
H01L 21/677 (2006.01) ,B25J 13/08 (2006.01) ,B65G 49/07 (2006.01) ,H01L 21/68 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
B PERFORMING OPERATIONS; TRANSPORTING
25
HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; HANDLES FOR HAND IMPLEMENTS; WORKSHOP EQUIPMENT; MANIPULATORS
J
MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
13
Controls for manipulators
08
by means of sensing devices, e.g. viewing or touching devices
B PERFORMING OPERATIONS; TRANSPORTING
65
CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
G
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
49
Conveying systems characterised by their application for specified purposes not otherwise provided for
05
for fragile or damageable materials or articles
07
for semiconductor wafers
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68
for positioning, orientation or alignment
Applicants:
川崎重工業株式会社 KAWASAKI JUKOGYO KABUSHIKI KAISHA [JP/JP]; 兵庫県神戸市中央区東川崎町3丁目1番1号 1-1, Higashikawasaki-cho 3-chome, Chuo-ku, Kobe-shi, Hyogo 6508670, JP
Inventors:
吉田 雅也 YOSHIDA, Masaya; --
野口 健治 NOGUCHI, Kenji; --
岡田 拓之 OKADA, Hiroyuki; --
Agent:
特許業務法人 有古特許事務所 PATENT CORPORATE BODY ARCO PATENT OFFICE; 兵庫県神戸市中央区東町123番地の1 貿易ビル3階 3rd Fl., Bo-eki Bldg., 123-1, Higashimachi, Chuo-ku, Kobe-shi, Hyogo 6500031, JP
Priority Data:
2017-19161829.09.2017JP
Title (EN) SUBSTRATE TRANSPORT DEVICE AND SUBSTRATE CARRYING UNIT ROTATION AXIS SEARCH METHOD
(FR) DISPOSITIF DE TRANSPORT DE SUBSTRAT ET PROCÉDÉ DE RECHERCHE D'AXE DE ROTATION D'UNITÉ DE TRANSPORT DE SUBSTRAT
(JA) 基板搬送装置及び基板載置部の回転軸の探索方法
Abstract:
(EN) The invention involves: detecting a target provided on a substrate carrying unit with an object detection sensor at each of a plurality of rotational positions of a substrate carrying unit, and determining a reference length, which is the distance from a robot reference axis to the target in a direction orthogonal to the axial direction, or information correlated to the reference length; determining at least one rotational position of a detection line from the rotational position when the robot reference axis serves as the rotational center and the rotational position when the rotational axis of the substrate carrying unit serves as the center for when a target positioned on a straight line connecting the robot reference axis and a rotational axis is detected, on the basis of the determined reference length or the information correlated thereto; and specifying, on the basis of the determined rotational position, the direction in which the rotational axis is present, as observed from the robot reference axis.
(FR) L'invention consiste à : détecter une cible disposée sur une unité de transport de substrat avec un capteur de détection d'objet au niveau de chacune d'une pluralité de positions de rotation d'une unité de transport de substrat, et déterminer une longueur de référence, qui est la distance d'un axe de référence de robot à la cible dans une direction orthogonale à la direction axiale, ou des informations corrélées à la longueur de référence ; déterminer au moins une position de rotation d'une ligne de détection à partir de la position de rotation lorsque l'axe de référence de robot sert de centre de rotation et la position de rotation lorsque l'axe de rotation de l'unité de support de substrat sert de centre pour lorsqu'une cible positionnée sur une ligne droite reliant l'axe de référence de robot et un axe de rotation est détectée, sur la base de la longueur de référence déterminée ou des informations corrélées à celle-ci ; et spécifier, sur la base de la position de rotation déterminée, la direction dans laquelle l'axe de rotation est présent, comme observé à partir de l'axe de référence de robot.
(JA) 基板載置部の複数の回転位置において、物体検出センサで基板載置部に設けられたターゲットを検出して、ロボット基準軸からターゲットまでの軸心方向と直交する方向の距離である指標長さ又はそれに相関する情報を求め、求めた指標長さ又はそれに相関する情報に基づいて、ロボット基準軸と回転軸とを結ぶ直線上に位置するターゲットを検出したときの、検出ラインのロボット基準軸を回転中心とする回転位置及び基板載置部の回転軸を中心とする回転位置の少なくとも一方の回転位置を求め、求めた回転位置に基づいて、ロボット基準軸から見た回転軸のある方向を特定する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)