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1. (WO2019064788) SCINTILLATOR PANEL AND RADIATION DETECTOR
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Pub. No.: WO/2019/064788 International Application No.: PCT/JP2018/025240
Publication Date: 04.04.2019 International Filing Date: 03.07.2018
IPC:
G21K 4/00 (2006.01) ,G01T 1/20 (2006.01) ,G01T 1/202 (2006.01)
G PHYSICS
21
NUCLEAR PHYSICS; NUCLEAR ENGINEERING
K
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
4
Conversion screens for the conversion of the spatial distribution of particles or ionising radiation into visible images, e.g. fluoroscopic screens
G PHYSICS
01
MEASURING; TESTING
T
MEASUREMENT OF NUCLEAR OR X-RADIATION
1
Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
16
Measuring radiation intensity
20
with scintillation detectors
G PHYSICS
01
MEASURING; TESTING
T
MEASUREMENT OF NUCLEAR OR X-RADIATION
1
Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
16
Measuring radiation intensity
20
with scintillation detectors
202
the detector being a crystal
Applicants:
浜松ホトニクス株式会社 HAMAMATSU PHOTONICS K.K. [JP/JP]; 静岡県浜松市東区市野町1126番地の1 1126-1, Ichino-cho, Higashi-ku, Hamamatsu-shi, Shizuoka 4358558, JP
Inventors:
白川 和広 SHIRAKAWA Kazuhiro; JP
後藤 啓輔 GOTO Keisuke; JP
山路 晴紀 YAMAJI Haruki; JP
上西 秀典 JONISHI Hidenori; JP
畑中 将志 HATANAKA Masashi; JP
櫻井 純 SAKURAI Jun; JP
Agent:
長谷川 芳樹 HASEGAWA Yoshiki; JP
黒木 義樹 KUROKI Yoshiki; JP
柴山 健一 SHIBAYAMA Kenichi; JP
Priority Data:
2017-18656227.09.2017JP
Title (EN) SCINTILLATOR PANEL AND RADIATION DETECTOR
(FR) PANNEAU DE SCINTILLATEUR ET DÉTECTEUR DE RAYONNEMENT
(JA) シンチレータパネル及び放射線検出器
Abstract:
(EN) This scintillator panel (10) is provided with: a substrate (11) having a substrate main surface (11a), a substrate rear surface (11b), and a substrate side surface (11c); a scintillator layer (12) formed by a plurality of prismatic crystals and having a scintillator rear surface (12b), a scintillator main surface (12a), and scintillator side surface (12c); and a protective membrane (13) that covers the scintillator side surface (12c) of the scintillator layer (12). The substrate side surface (11c) partially has a roughened region. The scintillator side surface (12c) has a rough surface (12ca) that includes a protrusion-and-recess structure. The protective membrane (13) is closely adhered to the scintillator side surface (12c) so as to cover the rough surfaces (11d), (12ca).
(FR) La présente invention concerne un panneau de scintillateur (10) comprenant : un substrat (11) ayant une surface principale de substrat (11a), une surface arrière de substrat (11b) et une surface latérale de substrat (11c) ; une couche de scintillateur (12) formée par une pluralité de cristaux prismatiques et ayant une surface arrière de scintillateur (12b), une surface principale de scintillateur (12a) et une surface latérale de scintillateur (12c) ; et une membrane de protection (13) qui recouvre la surface latérale de scintillateur (12c) de la couche de scintillateur (12). La surface latérale de substrat (11c) possède partiellement une région rugueuse. La surface latérale de scintillateur (12c) possède une surface rugueuse (12ca) qui comprend une structure en saillie et en creux. La membrane de protection (13) est étroitement collée à la surface latérale de scintillateur (12c) de manière à recouvrir les surfaces rugueuses (11d, 2 ca).
(JA) シンチレータパネル(10)は、基板主面(11a)、基板裏面(11b)及び基板側面(11c)と、を有する基板(11)と、複数の柱状結晶により形成され、シンチレータ裏面(12b)、シンチレータ主面(12a)及びシンチレータ側面(12c)を有するシンチレータ層(12)と、シンチレータ層(12)のシンチレータ側面(12c)を覆う保護膜(13)と、を備える。基板側面(11c)は、粗面化された領域を部分的に有する。シンチレータ側面(12c)は、凹凸構造を含む粗面(12ca)を有する。保護膜(13)は、粗面(11d),(12ca)を覆うようにシンチレータ側面(12c)に対して密着する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)