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1. (WO2019064710) ADSORPTIVE TEMPORARY FIXING SHEET
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Pub. No.: WO/2019/064710 International Application No.: PCT/JP2018/022209
Publication Date: 04.04.2019 International Filing Date: 11.06.2018
IPC:
C09J 7/10 (2018.01) ,B32B 5/18 (2006.01) ,B32B 7/02 (2006.01) ,C08J 9/00 (2006.01) ,C09J 7/38 (2018.01) ,C09J 183/04 (2006.01)
[IPC code unknown for C09J 7/10]
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
5
Layered products characterised by the non-homogeneity or physical structure of a layer
18
characterised by features of a layer containing foamed or specifically porous material
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
7
Layered products characterised by the relation between layers, i.e. products essentially comprising layers having different physical properties or products characterised by the interconnection of layers
02
in respect of physical properties, e.g. hardness
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
9
Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
[IPC code unknown for C09J 7/38]
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
J
ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
183
Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
04
Polysiloxanes
Applicants:
日東電工株式会社 NITTO DENKO CORPORATION [JP/JP]; 大阪府茨木市下穂積1丁目1番2号 1-1-2, Shimohozumi, Ibaraki-shi, Osaka 5678680, JP
Inventors:
伊関 亮 ISEKI Toru; JP
加藤 和通 KATO Kazumichi; JP
徳山 英幸 TOKUYAMA Hideyuki; JP
金田 充宏 KANADA Mitsuhiro; JP
Agent:
籾井 孝文 MOMII Takafumi; JP
Priority Data:
2017-18857028.09.2017JP
Title (EN) ADSORPTIVE TEMPORARY FIXING SHEET
(FR) FEUILLE DE FIXATION TEMPORAIRE PAR ASPIRATION
(JA) 吸着仮固定シート
Abstract:
(EN) An adsorptive temporary fixing sheet is provided which has sufficient shear adhesive strength in the same direction as the surface, weak adhesive strength in the direction perpendicular to the surface, and has excellent antistatic performance. This adsorptive temporary fixing sheet, which has a foam layer having an open-cell structure, has a surface resistivity of 1.0×104 to 1.0×1010 Ω/2, and, defining V1 (N/1cm2) as the silicon chip perpendicular adhesive strength of the surface of said foam layer after 18 hours at -30°C, V2 (N/1cm2) as the silicon chip perpendicular adhesive strength after 18 hours at 23°C and V3 (N/1cm2) as the silicon chip perpendicular adhesive strength after 18 hours at 80°C, and defining H1 (N/1cm2) as the silicon chip shear adhesive strength of the surface of said foam layer after 18 hours at -30°C, H2 (N/1cm2) as the silicon chip shear adhesive strength after 18 hours at 23°C and H3 (N/1cm2) as the silicon chip shear adhesive strength after 18 hours at 80°C, it holds that V1 < H1, V2 < H2 and V3 < H3.
(FR) L'invention fournit une feuille de fixation temporaire par aspiration qui possède une force d'adhésion au cisaillement suffisante dans la même direction que sa surface, mais possède une force d'adhésion faible dans une direction perpendiculaire à sa surface, et qui possède d'excellentes performances antistatiques. La feuille de fixation temporaire par aspiration de l'invention possède une couche de mousse équipée d'une structure en alvéoles ouvertes. Sa résistivité de surface est comprise entre 1,0×10Ω/2 et 1,0×1010Ω/2. Lorsqu'une force d'adhésion perpendiculaire à une puce de silicium de la surface de la couche de mousse après 18 heures à -30℃ est représentée par V1(N/1cm2), qu'une force d'adhésion perpendiculaire à la puce de silicium après 18 heures à 23°C est représentée par V2(N/1cm2), et qu'une force d'adhésion perpendiculaire à la puce de silicium après 18 heures à 80°C est représentée par V3(N/1cm2), et lorsqu'une force d'adhésion au cisaillement de puce de silicium de la surface de la couche de mousse après 18 heures à -30℃ est représentée par H1(N/1cm2), qu'une force d'adhésion au cisaillement de puce de silicium après 18 heures à 23°C est représentée par H2(N/1cm2), et qu'une force d'adhésion au cisaillement de puce de silicium après 18 heures à -80°C est représentée par H3(N/1cm2), alors V1<H1, V2<H2 et V3<H3.
(JA) 表面と同じ方向には十分なせん断接着力を有し、表面に対して垂直方向には弱い接着力を有し、優れた帯電防止性能を有する、吸着仮固定シートを提供する。 本発明の吸着仮固定シートは、連続気泡構造を備える発泡層を有する吸着仮固定シートであって、表面抵抗率が1.0×10Ω/□~1.0×1010Ω/□であり、該発泡層の表面の、-30℃で18時間後のシリコンチップ垂直接着力をV1(N/1cm□)、23℃で18時間後のシリコンチップ垂直接着力をV2(N/1cm□)、80℃で18時間後のシリコンチップ垂直接着力をV3(N/1cm□)とし、該発泡層の表面の、-30℃で18時間後のシリコンチップせん断接着力をH1(N/1cm□)、23℃で18時間後のシリコンチップせん断接着力をH2(N/1cm□)、80℃で18時間後のシリコンチップせん断接着力をH3(N/1cm□)としたとき、V1<H1、V2<H2、V3<H3である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)