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1. (WO2019064585) SUBSTRATE HANDLING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
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Pub. No.: WO/2019/064585 International Application No.: PCT/JP2017/035721
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
G03F 7/20 (2006.01) ,H01L 21/677 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
青木保夫 AOKI, Yasuo; JP
Agent:
片山修平 KATAYAMA, Shuhei; JP
Priority Data:
Title (EN) SUBSTRATE HANDLING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
(FR) DISPOSITIF DE MANIPULATION DE SUBSTRAT, DISPOSITIF D'EXPOSITION, PROCÉDÉ DE PRODUCTION D'ÉCRAN PLAT, PROCÉDÉ DE PRODUCTION DE DISPOSITIF, PROCÉDÉ DE MANIPULATION DE SUBSTRAT ET PROCÉDÉ D'EXPOSITION
(JA) 基板搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、基板搬送方法、及び露光方法
Abstract:
(EN) In order to shorten the time required for substrate replacement, this substrate handling device which conveys a substrate to the holding surface of a holding device comprises: a first holding portion which is positioned above the holding surface, and which holds the substrate in a state in which that the distance between one portion of the substrate and the holding surface is shorter than the distance between another portion of the substrate and the holding surface; a second holding portion which holds another portion of the substrate held by the first holding portion; and a drive unit which moves the holding device, the second holding portion and the first holding portion relative to one another in a direction along the holding surface, in such a manner that the first holding portion is retracted from above the holding device.
(FR) Dans le but de raccourcir le temps nécessaire au remplacement de substrat, le dispositif de manipulation de substrat que concerne la présente invention et qui transporte un substrat jusqu'à la surface de support d'un dispositif de maintien comprend : une première partie de maintien qui est positionnée au-dessus de la surface de support et qui maintient le substrat dans un état dans lequel la distance entre une partie du substrat et la surface de maintien est plus courte que la distance entre une autre partie du substrat et la surface de maintien ; une seconde partie de maintien qui maintient une autre partie du substrat maintenu par la première partie de maintien ; et un mécanisme d'entraînement qui déplace le dispositif de maintien, la seconde partie de maintien et la première partie de maintien les uns par rapport aux autres dans une direction le long de la surface de maintien de telle sorte que la première partie de maintien soit retirée d'une position au-dessus du dispositif de maintien.
(JA) 基板交換にかかる時間を短縮するため、基板を保持装置の保持面へ搬送する基板搬送装置において、前記保持面の上方に設けられ、前記基板の一部と前記保持面との距離が前記基板の他部と前記保持面との距離よりも短い状態の前記基板を保持する第1保持部と、前記第1保持部に保持された前記基板の他部を保持する第2保持部と、前記第1保持部が前記保持装置の上方から退避されるように、前記保持装置及び前記第2保持部と前記第1保持部とを前記保持面へ沿った方向へ相対移動させる駆動部と、を備える基板搬送装置である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)