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1. (WO2019064583) SUBSTRATE HANDLING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
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Pub. No.: WO/2019/064583 International Application No.: PCT/JP2017/035719
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
G03F 7/20 (2006.01) ,H01L 21/677 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
青木保夫 AOKI, Yasuo; JP
Agent:
片山修平 KATAYAMA, Shuhei; JP
Priority Data:
Title (EN) SUBSTRATE HANDLING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
(FR) DISPOSITIF DE MANIPULATION DE SUBSTRAT, DISPOSITIF D'EXPOSITION, PROCÉDÉ DE PRODUCTION D'AFFICHAGE À PANNEAU PLAT, PROCÉDÉ DE PRODUCTION DE DISPOSITIF, PROCÉDÉ DE MANIPULATION DE SUBSTRAT ET PROCÉDÉ D'EXPOSITION
(JA) 基板搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、基板搬送方法、及び露光方法
Abstract:
(EN) In order to shorten the time required for substrate replacement, this substrate handling device which conveys a substrate to a holding device comprises: a first holding portion which holds the substrate above the holding device; a second holding portion which holds part of the substrate held by the first holding portion; and a drive unit which moves the holding device and one of the second holding portion and the first holding portion relative to one another in such a manner that the first holding portion retracts from above the holding device. The substrate is held during the relative movement of the holding device, first holding portion and second holding portion caused by the drive unit.
(FR) Selon l'invention, afin de raccourcir le temps nécessaire au remplacement d'un substrat, ce dispositif de manipulation de substrat qui transporte un substrat vers un dispositif de maintien comprend: une première partie de maintien qui maintient le substrat au-dessus du dispositif de maintien; une seconde partie de maintien qui maintient une partie du substrat maintenue par la première partie de maintien; et une unité d'entraînement qui déplace le dispositif de maintien et l'une de la seconde partie de maintien et de la première partie de maintien l'une par rapport à l'autre de telle sorte que la première partie de maintien se rétracte depuis le dessus du dispositif de maintien. Le substrat est maintenu pendant le mouvement relatif du dispositif de maintien, de la première partie de maintien et de la seconde partie de maintien provoqué par l'unité d'entraînement.
(JA) 基板交換にかかる時間を短縮するため、基板を保持装置に搬送する基板搬送装置において、前記保持装置の上方で前記基板を保持する第1保持部と、前記第1保持部に保持された前記基板の一部を保持する第2保持部と、前記第1保持部が前記保持装置の上方から退避されるように、前記保持装置及び前記第2保持部と前記第1保持部との一方を他方に対して相対移動させる駆動部と、を備え、前記保持装置と前記第1保持部と前記第2保持部とは、前記駆動部による相対移動中に前記基板を保持する基板搬送装置である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)