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1. (WO2019064577) SUBSTRATE HANDLING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
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Pub. No.: WO/2019/064577 International Application No.: PCT/JP2017/035710
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
G03F 7/20 (2006.01) ,H01L 21/677 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
青木保夫 AOKI, Yasuo; JP
Agent:
片山修平 KATAYAMA, Shuhei; JP
Priority Data:
Title (EN) SUBSTRATE HANDLING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
(FR) DISPOSITIF DE MANIPULATION DE SUBSTRAT, DISPOSITIF D'EXPOSITION, PROCÉDÉ DE PRODUCTION D'ÉCRAN PLAT, PROCÉDÉ DE PRODUCTION DE DISPOSITIF, PROCÉDÉ DE MANIPULATION DE SUBSTRAT ET PROCÉDÉ D'EXPOSITION
(JA) 基板搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、基板搬送方法、及び露光方法
Abstract:
(EN) In order to shorten the time required for substrate replacement, this substrate handling device (100A) which conveys a substrate (P2) to the holding surface (TS) of a holding device comprises: a first holding portion (161A) which holds the substrate (P2) above the holding device; a second holding portion (184a) which holds part of the substrate (P2) held by the first holding portion (161A); and a drive unit (164) which moves the holding device, the second holding portion (184a) and the first holding portion (161A) relative to one another in a predetermined direction along the holding surface, in such a manner that the first holding portion (161A) is retracted from above the holding device. While the first holding portion (161A) is undergoing relative movement caused by the drive unit (164), the substrate (P2) is held in such a manner that the position in the vertical direction of the region of the substrate (P2) which is held by the first holding portion (161A) approaches the holding device.
(FR) Afin de réduire le temps nécessaire au remplacement de substrat, le dispositif de manipulation de substrat (100A) que concerne la présente invention et qui transporte un substrat (P2) vers la surface de maintien (TS) d'un dispositif de maintien comprend : une première partie de maintien (161A) qui maintient le substrat (P2) au-dessus du dispositif de maintien ; une seconde partie de maintien (184a) qui maintient une partie du substrat (P2) maintenu par la première partie de maintien (161A) ; et un mécanisme d'entraînement (164) qui déplace le dispositif de maintien, la seconde partie de maintien (184a) et la première partie de maintien (161A) les uns par rapport aux autres dans une direction prédéterminée le long de la surface de maintien, de telle sorte que la première partie de maintien (161A) est retirée d'une position au-dessus du dispositif de maintien. Pendant que la première partie de maintien (161A) est soumise à un mouvement relatif provoqué par le mécanisme d'entraînement (164), le substrat (P2) est maintenu de telle sorte que la position dans la direction verticale de la région du substrat (P2) qui est maintenue par la première partie de maintien (161A) s'approche du dispositif de maintien.
(JA) 基板交換にかかる時間を短縮するため、基板(P2)を保持装置の保持面(TS)に搬送する基板搬送装置(100A)において、前記保持装置の上方で前記基板(P2)を保持する第1保持部(161A)と、前記第1保持部(161A)に保持された前記基板(P2)の一部を保持する第2保持部(184a)と、前記第1保持部(161A)が前記保持装置の上方から退避されるように、前記保持装置及び前記第2保持部(184a)と前記第1保持部(161A)とを、前記保持面に沿う所定方向へ相対移動させる駆動部(164)と、を備え、前記第1保持部(161A)は、前記駆動部(164)による相対移動中に、前記基板(P2)のうち前記第1保持部(161A)に保持された領域の上下方向の位置が前記保持装置に近づくよう、前記基板(P2)を保持する基板搬送装置(100A)である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)