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1. (WO2019064576) SUBSTRATE HANDING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
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Pub. No.: WO/2019/064576 International Application No.: PCT/JP2017/035709
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
G03F 7/20 (2006.01) ,H01L 21/677 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
青木保夫 AOKI, Yasuo; JP
Agent:
片山修平 KATAYAMA, Shuhei; JP
Priority Data:
Title (EN) SUBSTRATE HANDING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
(FR) DISPOSITIF DE MANIPULATION DE SUBSTRAT, DISPOSITIF D'EXPOSITION, PROCÉDÉ DE PRODUCTION D'ÉCRAN PLAT, PROCÉDÉ DE PRODUCTION DE DISPOSITIF, PROCÉDÉ DE MANIPULATION DE SUBSTRAT ET PROCÉDÉ D'EXPOSITION
(JA) 基板搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、基板搬送方法、及び露光方法
Abstract:
(EN) In order to shorten the time required for substrate replacement, this substrate handling device (100A) which transports a substrate (P2) to the holding surface (TS) of a holding device which can hold the substrate (P2) comprises: a first holding portion (161A) which has a substrate holding surface which holds the substrate (P2) above the holding device; a second holding portion (184A) which holds part of the substrate (P2) held by the first holding portion (161A) at a position between the holding surface (TS) and the substrate holding surface with respect to the vertical direction; and a drive unit (164) which moves the holding device, the second holding portion (184A) and the first holding portion (161A) relative to one another in a state in which the second holding portion (184A) holds part of the substrate (P2), in order that the first holding portion (161A) is retracted from above the holding device.
(FR) Afin de raccourcir le temps nécessaire au remplacement d'un substrat, l'invention concerne un dispositif de manipulation de substrat (100A) transportant un substrat (P2) vers la surface de support (TS) d'un dispositif de support qui peut porter le substrat (P2), qui comprend : une première partie de support (161A) qui a une surface de support de substrat qui porte le substrat (P2) au-dessus du dispositif de support ; une seconde partie de support (184A) qui porte une partie du substrat (P2) maintenue par la première partie de support (161A) dans une position entre la surface de support (TS) et la surface de support de substrat par rapport à la direction verticale ; et une unité d'entraînement (164) qui déplace le dispositif de support, la seconde partie de support (184A) et la première partie de support (161A) l'une par rapport à l'autre dans un état dans lequel la seconde partie de support (184A) porte une partie du substrat (P2), afin que la première partie de support (161A) soit rétractée depuis le dessus du dispositif de support.
(JA) 基板交換にかかる時間を短縮するため、基板(P2)を保持可能な保持装置の保持面(TS)へ前記基板(P2)を搬送する基板搬送装置(100A)において、前記保持装置の上方で前記基板(P2)を保持する基板保持面を有する第1保持部(161A)と、上下方向に関して前記保持面(TS)と前記基板保持面との間の位置で、前記第1保持部(161A)に保持された前記基板(P2)の一部を保持する第2保持部(184a)と、前記第1保持部(161A)が前保持装置の上方から退避されるように、前記第2保持部(184a)が前記基板(P2)の前記一部を保持した状態で、前記保持装置及び前記第2保持部(184a)と前記第1保持部(161A)とを相対移動させる駆動部(164)と、を備える基板搬送装置(100A)である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)