Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019064573) PHOTOMASK, DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/064573 International Application No.: PCT/JP2017/035705
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
G03F 1/00 (2012.01) ,H01L 51/50 (2006.01) ,H05B 33/10 (2006.01) ,H05B 33/22 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
12
Light sources with substantially two-dimensional radiating surfaces
22
characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Applicants:
シャープ株式会社 SHARP KABUSHIKI KAISHA [JP/JP]; 大阪府堺市堺区匠町1番地 1, Takumi-cho, Sakai-ku, Sakai City, Osaka 5908522, JP
Inventors:
郡司 遼佑 GUNJI, Ryosuke; --
岡部 達 OKABE, Tohru; --
谷山 博己 TANIYAMA, Hiroki; --
市川 伸治 ICHIKAWA, Shinji; --
齋田 信介 SAIDA, Shinsuke; --
神村 浩治 JINMURA, Hiroharu; --
仲田 芳浩 NAKADA, Yoshihiro; --
井上 彬 INOUE, Akira; --
Agent:
特許業務法人HARAKENZO WORLD PATENT & TRADEMARK HARAKENZO WORLD PATENT & TRADEMARK; 大阪府大阪市北区天神橋2丁目北2番6号 大和南森町ビル Daiwa Minamimorimachi Building, 2-6, Tenjinbashi 2-chome Kita, Kita-ku, Osaka-shi, Osaka 5300041, JP
Priority Data:
Title (EN) PHOTOMASK, DISPLAY DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
(FR) PHOTOMASQUE, DISPOSITIF D'AFFICHAGE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF D'AFFICHAGE
(JA) フォトマスク、表示装置及び表示装置の製造方法
Abstract:
(EN) This photomask (1) is provided with: transmissive sections that form the openings; semitransmissive sections that form the flat sections; and light-blocking sections that form the photo spacer sections. The light-blocking sections are formed in island shapes among the plurality of transmissive sections which are arrayed in a lattice shape. End sections of the light-blocking sections sandwiched between the two transmissive sections are formed so as to extend along the outer edges of the transmissive sections.
(FR) La présente invention concerne un photomasque (1) qui comporte : des sections transmissives qui forment les ouvertures ; des sections semi-transmissives qui forment les sections plates ; et des sections qui bloquent la lumière et qui forment les sections de photo-espaceur. Les sections qui bloquent la lumière sont formées en formes d'îlot parmi la pluralité de sections transmissives qui sont disposées selon une forme de réseau. Des extrémités des sections qui bloquent la lumière et qui sont prises en sandwich entre les deux sections transmissives sont formées de façon à s'étendre le long des bords extérieurs des sections transmissives.
(JA) フォトマスク(1)は、前記開口部を形成する透過部と、前記平坦部を形成する半透過光部と、前記フォトスペーサ部を形成する遮光部と、を備え、 前記遮光部は格子状に並ぶ複数の前記透過部の間に島状に形成され、 2つの前記透過部に挟まれた前記遮光部の端部は前記透過部の外縁に沿って延伸するように形成される
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)