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1. (WO2019064528) TRANSFER-TYPE PHOTOSENSITIVE FILM, METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR PRODUCING FORCE SENSOR, AND FORCE SENSOR
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Pub. No.: WO/2019/064528 International Application No.: PCT/JP2017/035593
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
G01L 1/22 (2006.01) ,G01L 5/00 (2006.01) ,G06F 3/041 (2006.01)
G PHYSICS
01
MEASURING; TESTING
L
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
1
Measuring force or stress, in general
20
by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
22
using resistance strain gauges
G PHYSICS
01
MEASURING; TESTING
L
MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
5
Apparatus for, or methods of, measuring force, e.g. due to impact, work, mechanical power, or torque, adapted for special purposes
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
3
Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01
Input arrangements or combined input and output arrangements for interaction between user and computer
03
Arrangements for converting the position or the displacement of a member into a coded form
041
Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Applicants:
日立化成株式会社 HITACHI CHEMICAL COMPANY, LTD. [JP/JP]; 東京都千代田区丸の内一丁目9番2号 9-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1006606, JP
Inventors:
渡邊 匠 WATANABE Takumi; JP
安部 攻治 ABE Koji; JP
鮎ヶ瀬 友洋 AYUGASE Tomohiro; JP
南 征志 MINAMI Masashi; JP
向 郁夫 MUKAI Ikuo; JP
Agent:
長谷川 芳樹 HASEGAWA Yoshiki; JP
清水 義憲 SHIMIZU Yoshinori; JP
平野 裕之 HIRANO Hiroyuki; JP
Priority Data:
Title (EN) TRANSFER-TYPE PHOTOSENSITIVE FILM, METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR PRODUCING FORCE SENSOR, AND FORCE SENSOR
(FR) FILM PHOTOSENSIBLE DE TYPE TRANSFERT, PROCÉDÉ DE FORMATION DE FILM PROTECTEUR, PROCÉDÉ DE PRODUCTION DE CAPTEUR DE FORCE, ET CAPTEUR DE FORCE
(JA) 転写型感光性フィルム、保護膜の形成方法、フォースセンサの製造方法及びフォースセンサ
Abstract:
(EN) A transfer-type photosensitive film which is provided with: a supporting film; and a photosensitive resin layer which is provided on the supporting film and contains a binder polymer, a photopolymerizable compound having an ethylenically unsaturated group and a photopolymerization initiator. This transfer-type photosensitive film is configured such that: the binder polymer has an acid value of 110 mgKOH/g or more; and the SP value of the photopolymerizable compound as determined by Fedors' estimation method is 20.5 (MJ/m3)1/2 or more. This transfer-type photosensitive film is used for the formation of a protective film for a substrate that is provided with an electrode containing a copper-nickel alloy.
(FR) L’invention concerne un film photosensible de type transfert étant pourvu : d'un film de support ; et d'une couche de résine photosensible qui est disposée sur le film de support et contient un polymère liant, un composé photopolymérisable ayant un groupe éthyléniquement insaturé et un initiateur de photopolymérisation. Ce film photosensible de type transfert est configuré de telle sorte que : le polymère liant ait une valeur acide de 110 mg de KOH/g ou plus ; et la valeur SP du composé photopolymérisable telle que déterminée par le procédé d'estimation de Fedors soit de 20,5 (MJ/m3)1/2 ou plus. Ce film photosensible de type transfert est utilisé pour la formation d'un film protecteur pour un substrat qui est pourvu d'une électrode contenant un alliage cuivre-nickel.
(JA) 支持フィルムと、該支持フィルム上に設けられた、バインダーポリマー、エチレン性不飽和基を有する光重合性化合物及び光重合開始剤を含む感光性樹脂層と、を備える、転写型感光性フィルムであって、バインダーポリマーの酸価が110mgKOH/g以上であり、光重合性化合物のFedrosの推算法に基づくSP値が20.5(MJ/m1/2以上であり、銅ニッケル合金を含む電極を備える基材の保護膜の形成に用いられる、転写型感光性フィルム。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)