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1. (WO2019064511) ELECTRON BEAM APPARATUS, AND DEVICE MANUFACTURING METHOD
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Pub. No.: WO/2019/064511 International Application No.: PCT/JP2017/035556
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
H01L 21/027 (2006.01) ,G03F 7/20 (2006.01) ,H01J 37/06 (2006.01) ,H01J 37/305 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06
Electron sources; Electron guns
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30
Electron-beam or ion-beam tubes for localised treatment of objects
305
for casting, melting, evaporating, or etching
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
佐藤 真路 SATO, Shinji; JP
Agent:
立石 篤司 TATEISHI, Atsuji; JP
Priority Data:
Title (EN) ELECTRON BEAM APPARATUS, AND DEVICE MANUFACTURING METHOD
(FR) APPAREIL À FAISCEAU D'ÉLECTRONS ET SON PROCÉDÉ DE FABRICATION
(JA) 電子ビーム装置及びデバイス製造方法
Abstract:
(EN) An electron beam apparatus comprises: a light irradiation apparatus (80) that irradiates a photoelectric element (54) with light; and an electron beam optical system (70) that bombards a wafer W with a an electron beam produced from the photoelectric element due to the irradiation with light by the light irradiation apparatus (80), wherein the light irradiation apparatus (80) has an illumination system, an optical device that produces a plurality of light beams using the light from the illumination system, a first deflection part that deflects the light from the illumination system, a second deflection part that deflects a plurality of light beams from a pattern generator, and a projection system that irradiates the photoelectric element with at least one light beam from the second deflection part.
(FR) L'invention concerne un appareil à faisceau d'électrons comprenant : un appareil d'éclairement lumineux (80) qui éclaire un élément photoélectrique (54) avec de la lumière ; et un système optique à faisceau d'électrons (70) qui bombarde une galette W avec un faisceau d'électrons produit à partir de l'élément photoélectrique en raison de l'éclairement avec de la lumière par l'appareil d'éclairement lumineux (80). L'appareil d'éclairement lumineux (80) comprend un système d'éclairement, un dispositif optique qui produit une pluralité de faisceaux lumineux en utilisant la lumière provenant du système d'éclairement, une première partie de déviation qui dévie la lumière provenant du système d'éclairement, une deuxième partie de déviation qui dévie une pluralité de faisceaux lumineux provenant d'un générateur de motifs, et un système de projection qui éclaire l'élément photoélectrique avec au moins un faisceau lumineux provenant de la deuxième partie de déviation.
(JA) 電子ビーム装置は、光電素子(54)に光を照射する光照射装置(80)と、光照射装置(80)による光の照射によって光電素子から発生する電子ビームをウエハWに照射する電子ビーム光学系(70)と、を備え、光照射装置(80)は、照明系と、照明系からの光で複数の光ビームを発生させる光学デバイスと、照明系からの光を偏向する第1偏向部と、パターンジェネレータからの複数の光ビームを偏向する第2偏向部と、第2偏向部からの少なくとも1つの光ビームを光電素子に照射する投影系と、を有する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)