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1. (WO2019064508) ELECTRON BEAM APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
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Pub. No.: WO/2019/064508 International Application No.: PCT/JP2017/035536
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
H01L 21/027 (2006.01) ,G03F 7/20 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
佐藤 真路 SATO, Shinji; JP
柴崎 祐一 SHIBAZAKI, Yuichi; JP
Agent:
立石 篤司 TATEISHI, Atsuji; JP
Priority Data:
Title (EN) ELECTRON BEAM APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
(FR) APPAREIL À FAISCEAU D'ÉLECTRONS, PROCÉDÉ D'EXPOSITION, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
(JA) 電子ビーム装置及び露光方法、並びにデバイス製造方法
Abstract:
(EN) An electron beam apparatus comprises: an optical device (184) that can supply a plurality of optical beams; a condensing member (187) that is positioned such that the plurality of optical beams from a plurality of locations of the optical device (184) are condensed to a first location of a photoelectric element (54); and an electron optical system that makes electrons emitted from the photoelectric element into an electron beam and uses this to bombard a target.
(FR) La présente invention concerne un appareil à faisceau d'électrons comprenant : un dispositif optique (184) qui peut fournir une pluralité de faisceaux optiques ; un élément de condensation (187) qui est positionné de telle sorte que la pluralité de faisceaux optiques provenant d'une pluralité d'emplacements du dispositif optique (184) sont condensés à un premier emplacement d'un élément photoélectrique (54) ; et un système optique d'électrons qui transforme des électrons émis à partir de l'élément photoélectrique en un faisceau d'électrons et l'utilise pour bombarder une cible.
(JA) 電子ビーム装置は、複数の光ビームを提供可能な光学デバイス(184)と、光学デバイス(184)の複数位置からの複数の光ビームが光電素子(54)の第1位置に集光されるように配置された集光部材(187)と、光電素子から放出される電子を電子ビームとしてターゲットに照射する電子光学系と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)