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1. (WO2019064507) ELECTRON BEAM APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
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Pub. No.: WO/2019/064507 International Application No.: PCT/JP2017/035533
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
H01L 21/027 (2006.01) ,G03F 7/20 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
佐藤 真路 SATO, Shinji; JP
柴崎 祐一 SHIBAZAKI, Yuichi; JP
Agent:
立石 篤司 TATEISHI, Atsuji; JP
Priority Data:
Title (EN) ELECTRON BEAM APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
(FR) APPAREIL À FAISCEAU D'ÉLECTRONS, PROCÉDÉ D'EXPOSITION, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
(JA) 電子ビーム装置及び露光方法、並びにデバイス製造方法
Abstract:
(EN) An electron beam apparatus comprises: an optical device (184) that can supply a plurality of light beams; a condensing member (187) that condenses the plurality of light beams from a plurality of locations of the optical device to a first location of a photoelectric element; and an electron beam optical system (70) that makes electrons emitted from the photoelectric element (54) into a plurality of electron beams and uses these to bombard a target, wherein the intensity of the light beam with which the first location is irradiated is variable.
(FR) La présente invention concerne un appareil à faisceau d'électrons comprenant : un dispositif optique (184) qui peut fournir une pluralité de faisceaux lumineux ; un élément de condensation (187) qui condense la pluralité de faisceaux lumineux depuis une pluralité d'emplacements du dispositif optique vers un premier emplacement d'un élément photoélectrique ; et un système optique à faisceau d'électrons (70) qui forme une pluralité de faisceaux d'électrons à partir des électrons émis depuis l'élément photoélectrique (54) et bombarde une cible à l'aide desdits faisceaux d'électrons, l'intensité du faisceau lumineux à laquelle est exposé le premier emplacement étant variable.
(JA) 電子ビーム装置は、複数の光ビームを提供可能な光学デバイス(184)と、光学デバイスの複数位置からの複数の光ビームを光電素子の第1位置に集光する集光部材(187)と、光電素子(54)から放出される電子を複数の電子ビームとしてターゲットに照射する電子ビーム光学系(70)と、を備え、前記第1位置に照射される光ビームの強度は変更可能である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)