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1. (WO2019064504) NANOCARBON INK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE IN WHICH SAME IS USED
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Pub. No.: WO/2019/064504 International Application No.: PCT/JP2017/035526
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
H01L 51/05 (2006.01) ,C01B 32/159 (2017.01) ,H01L 51/30 (2006.01) ,H01L 51/40 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
05
specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier
[IPC code unknown for C01B 32/159]
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
05
specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier
30
Selection of materials
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
05
specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier
40
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants:
日本電気株式会社 NEC CORPORATION [JP/JP]; 東京都港区芝五丁目7番1号 7-1, Shiba 5-chome, Minato-ku, Tokyo 1088001, JP
Inventors:
沼田 秀昭 NUMATA Hideaki; JP
Agent:
棚井 澄雄 TANAI Sumio; JP
森 隆一郎 MORI Ryuichirou; JP
松沼 泰史 MATSUNUMA Yasushi; JP
伊藤 英輔 ITO Eisuke; JP
Priority Data:
Title (EN) NANOCARBON INK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE IN WHICH SAME IS USED
(FR) ENCRE DE NANOCARBONE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF À SEMI-CONDUCTEUR DANS LEQUEL CELLE-CI EST UTILISÉE
(JA) ナノカーボンインクおよびそれを用いた半導体デバイスの製造方法
Abstract:
(EN) This nanocarbon ink contains nanocarbon, a dispersion medium, and a polyoxyethylene alkyl ether represented by formula (1). Formula (1): CnH2n(OCH2CH2)mOH (where n = 12 to 18 and m = 20 to 100).
(FR) La présente invention concerne une encre de nanocarbone contenant du nanocarbone, un milieu de dispersion et un éther alcoylique de polyoxyéthylène représenté par la formule (1). Formule (1) : CnH2n(OCH2CH2)mOH (où n = 12 à 18 et m = 20 à 100).
(JA) 本発明のナノカーボンインクは、ナノカーボンと、分散媒と、下記式(1)で表わされるポリオキシエチレンアルキルエーテルとを含む。 C2n(OCHCHOH・・・(1) (但し、n=12~18、m=20~100である。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)