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1. (WO2019064473) VAPOR DEPOSITION MASK, MANUFACTURING METHOD FOR VAPOR DEPOSITION MASK, AND MANUFACTURING METHOD FOR DISPLAY DEVICE
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Pub. No.: WO/2019/064473 International Application No.: PCT/JP2017/035417
Publication Date: 04.04.2019 International Filing Date: 29.09.2017
IPC:
C23C 14/24 (2006.01) ,H05B 33/10 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Applicants:
シャープ株式会社 SHARP KABUSHIKI KAISHA [JP/JP]; 大阪府堺市堺区匠町1番地 1, Takumi-cho, Sakai-ku, Sakai City, Osaka 5908522, JP
Inventors:
中村 謙太 NAKAMURA, Kenta; --
Agent:
特許業務法人HARAKENZO WORLD PATENT & TRADEMARK HARAKENZO WORLD PATENT & TRADEMARK; 大阪府大阪市北区天神橋2丁目北2番6号 大和南森町ビル Daiwa Minamimorimachi Building, 2-6, Tenjinbashi 2-chome Kita, Kita-ku, Osaka-shi, Osaka 5300041, JP
Priority Data:
Title (EN) VAPOR DEPOSITION MASK, MANUFACTURING METHOD FOR VAPOR DEPOSITION MASK, AND MANUFACTURING METHOD FOR DISPLAY DEVICE
(FR) MASQUE DE DÉPÔT EN PHASE VAPEUR, PROCÉDÉ DE PRODUCTION DUDIT MASQUE DE DÉPÔT EN PHASE VAPEUR ET PROCÉDÉ DE PRODUCTION POUR DISPOSITIF D'AFFICHAGE
(JA) 蒸着用マスク、蒸着用マスクの製造方法及び表示装置の製造方法
Abstract:
(EN) Two divided masks (22a, 22b) adjoin in a second direction of the vapor deposition mask and have an overlap region (OR1) where the divided masks partially overlap each other in plan view, wherein the pitch (P) in the second direction between openings (23a) in multiple divided masks (22a, 22b) including the overlap region (OR1) is the same as the pitch (P) in the second direction between openings (23a) in each of the multiple divided masks (22a, 22b).
(FR) Deux masques divisés (22a, 22b) se rejoignent dans une seconde direction du masque de dépôt en phase vapeur et comportent une région de chevauchement (OR1) dans laquelle les masques divisés se chevauchent partiellement dans une vue en plan, le pas (P) dans la seconde direction entre des ouvertures (23a) dans de multiples masques divisés (22a, 22b), y compris la région de chevauchement (OR1), est identique au pas (P) dans la seconde direction entre des ouvertures (23a) dans chacun des multiples masques divisés (22a, 22b).
(JA) 蒸着用マスクの第2方向において、互いに隣接する2つのディバイデッドマスク(22a、22b)は、平面視において互いに一部が重なる重なり領域(OR1)を有し、重なり領域(OR1)を含む複数のディバイデッドマスク(22a、22b)における開口(23a)間の第2方向におけるピッチ(P)は、複数のディバイデッドマスク(22a、22b)各々における開口(23a)間の第2方向におけるピッチ(P)と同じである。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)