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1. (WO2019064426) VAPOR DEPOSITION SOURCE, VAPOR DEPOSITION DEVICE, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION FILM
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Pub. No.: WO/2019/064426 International Application No.: PCT/JP2017/035217
Publication Date: 04.04.2019 International Filing Date: 28.09.2017
IPC:
C23C 14/24 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/10 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Applicants:
シャープ株式会社 SHARP KABUSHIKI KAISHA [JP/JP]; 大阪府堺市堺区匠町1番地 1, Takumi-cho, Sakai-ku, Sakai City, Osaka 5908522, JP
Inventors:
西口 昌男 NISHIGUCHI, Masao; --
Agent:
特許業務法人HARAKENZO WORLD PATENT & TRADEMARK HARAKENZO WORLD PATENT & TRADEMARK; 大阪府大阪市北区天神橋2丁目北2番6号 大和南森町ビル Daiwa Minamimorimachi Building, 2-6, Tenjinbashi 2-chome Kita, Kita-ku, Osaka-shi, Osaka 5300041, JP
Priority Data:
Title (EN) VAPOR DEPOSITION SOURCE, VAPOR DEPOSITION DEVICE, AND METHOD FOR MANUFACTURING VAPOR DEPOSITION FILM
(FR) SOURCE DE DÉPÔT EN PHASE VAPEUR, DISPOSITIF DE DÉPÔT EN PHASE VAPEUR ET PROCÉDÉ DE PRODUCTION D'UN FILM DE DÉPÔT EN PHASE VAPEUR
(JA) 蒸着源および蒸着装置並びに蒸着膜製造方法
Abstract:
(EN) A vapor deposition source (1) is provided with an accommodating part (2) for accommodating vapor deposition particles (11), and a plurality of nozzles (3) arranged in a line along an X-axis direction, the plurality of nozzles at end parts in the X-axis direction of the accommodating part protruding in an oblique direction toward the end parts in the X-axis direction, the arrangement density of the nozzles in the end parts in the X-axis direction of the accommodating part being greater than the arrangement density of nozzles in a center part of the accommodating part, and a line (L2) connecting top end surfaces (32) of adjacent nozzles in the end parts in the X-axis direction of the accommodating part being a straight line.
(FR) L'invention concerne une source de dépôt en phase vapeur (1), qui est pourvue d'une partie de réception (2), destinée à recevoir des particules de dépôt en phase vapeur (11), et d'une pluralité de buses (3) agencées en ligne le long d'une direction d'axe X, la pluralité de buses au niveau de parties d'extrémité dans la direction d'axe X de la partie de réception faisant saillie dans une direction oblique vers les parties d'extrémité dans la direction d'axe X, la densité d'agencement des buses dans les parties d'extrémité dans la direction d'axe X de la partie de réception étant supérieure à la densité d'agencement de buses dans une partie centrale de la partie de réception, et une ligne (L2) reliant des surfaces d'extrémité supérieure (32) de buses adjacentes dans les parties d'extrémité dans la direction d'axe X de la partie de réception étant une ligne droite.
(JA) 蒸着源(1)は、蒸着粒子(11)を収容する収容部(2)と、X軸方向に沿ってライン状に配列された複数のノズル(3)と、を備え、収容部のX軸方向端部の複数のノズルは、X軸方向端部に向かって斜め方向に突出し、収容部のX軸方向端部におけるノズルの配設密度は、収容部の中央部におけるノズルの配設密度よりも高く、収容部のX軸方向端部において隣り合うノズルの上端面(32)同士を結ぶ線(L2)が直線状である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)