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1. (WO2019063934) METHOD FOR MANUFACTURING AN ELECTROLYTE FOR SOLID OXIDE CELLS BY MAGNETRON CATHODE SPUTTERING
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/063934 International Application No.: PCT/FR2018/052360
Publication Date: 04.04.2019 International Filing Date: 25.09.2018
IPC:
C23C 14/08 (2006.01) ,C23C 14/34 (2006.01) ,C23C 14/35 (2006.01) ,C23C 14/58 (2006.01) ,H01M 8/1246 (2016.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
35
by application of a magnetic field, e.g. magnetron sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
58
After-treatment
[IPC code unknown for H01M 8/1246]
Applicants:
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES [FR/FR]; Bat le Ponant 25 rue Leblanc 75015 Paris, FR
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE [FR/FR]; 3, rue Michel-Ange 75794 PARIS Cedex 16, FR
UNIVERSITE D'ORLEANS [FR/FR]; Avenue du Château de la Source 45100 ORLEANS, FR
Inventors:
VULLIET, Julien; FR
THOMANN, Anne-Lise; FR
CODDET, Pierre-Laurent; FR
Agent:
GUERRE, Fabien; FR
Priority Data:
17 5890226.09.2017FR
Title (EN) METHOD FOR MANUFACTURING AN ELECTROLYTE FOR SOLID OXIDE CELLS BY MAGNETRON CATHODE SPUTTERING
(FR) PROCÉDÉ DE FABRICATION PAR PULVÉRISATION CATHODIQUE MAGNÉTRON D'UN ÉLECTROLYTE POUR CELLULES ÉLECTROCHIMIQUES À OXYDE SOLIDE
Abstract:
(EN) The invention relates to a method that makes it possible to manufacture, by magnetron cathode sputtering, an electrolyte in the form of a thin, dense, stable film, capable of entering into the composition of so-called solid oxide cells (SOC), which include the cells for solid oxide fuel cells (SOFC) and the cells for high-temperature electrolysis cells (SOEC). This method is characterised in that it comprises the steps that consist of heating a substrate to a temperature ranging from 200°C to 1200°C; followed by subjecting the substrate to at least two treatment cycles, each treatment cycle comprising: 1) depositing one layer of a metal precursor on the substrate by magnetron cathode sputtering of a target made up of the metal precursor, the sputtering being carried out under elemental sputtering conditions; followed by 2) oxidation-crystallisation of the metal precursor forming the layer deposited on the substrate in the presence of oxygen to obtain the transformation of the metal precursor into the electrolyte material; and in that the substrate is kept at a temperature ranging from 200°C to 1200°C for the entire duration of each treatment cycle.
(FR) L'invention se rapporte à un procédé qui permet de fabriquer par pulvérisation cathodique magnétron un électrolyte sous la forme d'un film mince, dense et stable, propre à entrer dans la constitution de cellules électrochimiques dites à oxyde solide (SOC) dont font partie les cellules électrochimiques pour piles à combustible à oxyde solide (SOFC) et les cellules électrochimiques pour électrolyseurs haute température (SOEC). Ce procédé est caractérisé en ce qu'il comprend les étapes consistant à chauffer un substrat à une température allant de 200°C à 1200°C; puis soumettre le substrat à au moins deux cycles de traitement, chaque cycle de traitement comprenant : 1) un dépôt d'une couche d'un précurseur métallique sur le substrat par pulvérisation cathodique magnétron d'une cible constituée du précurseur métallique, la pulvérisation étant réalisée dans des conditions de pulvérisation élémentaire; puis 2) une oxydation-cristallisation du précurseur métallique formant la couche déposée sur le substrat en présence d'oxygène pour obtenir la transformation du précurseur métallique en le matériau d'électrolyte; et en ce que le substrat est maintenu à une température allant de 200°C à 1200°C pendant toute la durée de chaque cycle de traitement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)