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1. (WO2019063561) SAMPLE PRE-CHARGING METHODS AND APPARATUSES FOR CHARGED PARTICLE BEAM INSPECTION
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/063561 International Application No.: PCT/EP2018/075996
Publication Date: 04.04.2019 International Filing Date: 25.09.2018
IPC:
H01J 37/02 (2006.01) ,H01J 37/04 (2006.01) ,H01J 37/28 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
28
with scanning beams
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
LIU, Xuedong; US
XI, Qingpo; US
JIANG, Youfei; US
REN, Weiming; US
HU, Xuerang; US
CHEN, Zhongwei; US
Agent:
PETERS, John; NL
Priority Data:
62/566,15329.09.2017US
Title (EN) SAMPLE PRE-CHARGING METHODS AND APPARATUSES FOR CHARGED PARTICLE BEAM INSPECTION
(FR) PROCÉDÉS ET APPAREILS DE PRÉ-CHARGEMENT D'ÉCHANTILLON POUR INSPECTION DE FAISCEAU DE PARTICULES CHARGÉES
Abstract:
(EN) Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
(FR) Cette invention concerne un appareil comprenant : une source de particules chargées configurée pour émettre un faisceau de particules chargées le long d'un axe de faisceau primaire de l'appareil ; une lentille condensatrice configurée pour amener le faisceau à se concentrer autour de l'axe de faisceau primaire ; une ouverture ; une première lentille multipolaire ; une seconde lentille multipolaire, la première lentille multipolaire étant en aval par rapport à la lentille condensatrice et en amont par rapport à la seconde lentille multipolaire, la seconde lentille multipolaire étant en aval par rapport à la première lentille multipolaire et en amont par rapport à l'ouverture.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)