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1. (WO2019063558) IMAGE CONTRAST ENHANCEMENT IN SAMPLE INSPECTION
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Pub. No.: WO/2019/063558 International Application No.: PCT/EP2018/075984
Publication Date: 04.04.2019 International Filing Date: 25.09.2018
IPC:
H01J 37/02 (2006.01) ,H01J 37/28 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
28
with scanning beams
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
WANG, Yixiang; US
ZHANG, Frank, Nan; US
Agent:
PETERS, John; NL
Priority Data:
62/566,19529.09.2017US
Title (EN) IMAGE CONTRAST ENHANCEMENT IN SAMPLE INSPECTION
(FR) AMÉLIORATION DU CONTRASTE D'IMAGE DANS L'INSPECTION D'ÉCHANTILLONS
Abstract:
(EN) Disclosed herein is a method comprising: depositing a first amount of electric charges into a region of a sample, during a first time period; depositing a second amount of electric charges into the region, during a second time period; while scanning a probe spot generated on the sample by a beam of charged particles, recording from the probe spot signals representing interactions of the beam of charged particles and the sample; wherein an average rate of deposition during the first time period and an average rate of deposition during the second time period are different.
(FR) L'invention concerne un procédé consistant : à déposer une première quantité de charges électriques dans une région d'un échantillon, pendant une première durée ; à déposer une seconde quantité de charges électriques dans la région, pendant une seconde durée ; lors du balayage d'un point de sonde généré sur l'échantillon par un faisceau de particules chargées, à enregistrer à partir des signaux de point de sonde représentant des interactions du faisceau de particules chargées avec l'échantillon. Le taux moyen de dépôt pendant la première durée diffère du taux moyen de dépôt pendant la seconde durée.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)