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1. (WO2019063531) METHOD AND APPARATUS FOR AN ADVANCED CHARGED CONTROLLER FOR WAFER INSPECTION
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Pub. No.: WO/2019/063531 International Application No.: PCT/EP2018/075929
Publication Date: 04.04.2019 International Filing Date: 25.09.2018
IPC:
H01J 37/22 (2006.01) ,G01N 23/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
22
Optical or photographic arrangements associated with the tube
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23
Investigating or analysing materials by the use of wave or particle radiation not covered by group G01N21/ or G01N22/159
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
ZHANG, Jian; US
CHEN, Qing, Jiu; TW
WANG, Yixiang; US
Agent:
PETERS, John; NL
Priority Data:
62/566,21229.09.2017US
Title (EN) METHOD AND APPARATUS FOR AN ADVANCED CHARGED CONTROLLER FOR WAFER INSPECTION
(FR) PROCÉDÉ ET APPAREIL DE COMMANDE DE CHARGE AVANCÉE POUR INSPECTION DE TRANCHE
Abstract:
(EN) A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods further comprise a beam shaper configured to shape the emitted beam using an anamorphic prism group and a driver configured to direct the shaped beam to a specified position on a wafer, wherein the laser source, the beam shaper, and the driver are coaxially aligned.
(FR) La présente invention concerne un système et un procédé de commande de charge avancée d'un faisceau lumineux. Le système comprend une source laser comprenant une diode laser pour émettre un faisceau, et un homogénéisateur de faisceau pour homogénéiser le faisceau émis. Le système et les procédés comprennent en outre un dispositif de mise en forme de faisceau configuré pour mettre en forme le faisceau émis à l'aide d'un groupe de prismes anamorphiques, et un pilote configuré pour diriger le faisceau mis en forme vers une position spécifiée sur une tranche, la source laser, le dispositif de mise en forme de faisceau et le pilote étant alignés coaxialement.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)