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1. (WO2019063247) METHOD AND DEVICE FOR CHARACTERISING THE SURFACE SHAPE OF AN OPTICAL ELEMENT
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Pub. No.: WO/2019/063247 International Application No.: PCT/EP2018/073703
Publication Date: 04.04.2019 International Filing Date: 04.09.2018
IPC:
G01B 9/02 (2006.01) ,G01B 11/24 (2006.01) ,G01M 11/00 (2006.01) ,G01M 11/02 (2006.01) ,G03F 7/20 (2006.01) ,G06T 7/55 (2017.01)
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9
Instruments as specified in the subgroups and characterised by the use of optical measuring means
02
Interferometers
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
24
for measuring contours or curvatures
G PHYSICS
01
MEASURING; TESTING
M
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
11
Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
G PHYSICS
01
MEASURING; TESTING
M
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
11
Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
02
Testing of optical properties
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
[IPC code unknown for G06T 7/55]
Applicants:
RIEPENHAUSEN, Frank [DE/DE]; DE (US)
SCHRÖTER, Martin [DE/DE]; DE (US)
CARL ZEISS SMT GMBH [DE/DE]; Rudolf-Eber-Strasse 2 73447 Oberkochen, DE (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IR, IS, IT, JO, JP, KE, KG, KH, KM, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW)
Inventors:
RIEPENHAUSEN, Frank; DE
SCHRÖTER, Martin; DE
Agent:
FRANK, Hartmut; DE
Priority Data:
10 2017 217 371.829.09.2017DE
Title (EN) METHOD AND DEVICE FOR CHARACTERISING THE SURFACE SHAPE OF AN OPTICAL ELEMENT
(FR) PROCÉDÉ ET DISPOSITIF POUR LA CARACTÉRISATION DE LA FORME SUPERFICIELLE D'UN ÉLÉMENT OPTIQUE
(DE) VERFAHREN UND VORRICHTUNG ZUR CHARAKTERISIERUNG DER OBERFLÄCHENFORM EINES OPTISCHEN ELEMENTS
Abstract:
(EN) The invention relates to a method and a device for characterising the surface shape of an optical element, in particular a mirror or a lens of a micro-lithographic projection exposure system. A method according to the invention comprises the following steps: carrying out a plurality of interferometric measurements, in which a respective interferogram is recorded between a test wave coming from a respective section of the optical element and a reference wave, wherein the position of the optical element is altered relative to the test wave between these measurements; and calculating the deviation from the target shape of an optical element on the basis of these measurements, wherein this calculation occurs iteratively in such a way that, in a plurality of iteration steps, the deviation from the target shape of the optical element is determined by carrying out a forward calculation, wherein each of these iteration steps is based on a respective reference wave adjusted on the basis of the preceding iteration step.
(FR) L'invention concerne un procédé et un dispositif pour la caractérisation de la forme superficielle d'un élément optique, en particulier d'un miroir ou d'une lentille d'une installation d'éclairage par projection microlithographique. Un procédé selon l'invention présente les étapes suivantes, consistant à : réaliser une multitude de mesures par interférométrie, lors desquelles à chaque fois un interférogramme entre une onde de test partant à chaque fois d'une section de l'élément optique et une onde de référence est enregistré, la position de l'élément optique par rapport à l'onde de test étant modifiée entre ces mesures, et calculer la couleur de l'élément optique sur la base de ces mesures, ce calcul étant effectué par itération de manière telle que dans une multitude d'étapes d'itération, la couleur de l'élément optique est déterminée à chaque fois tout en effectuant un calcul vers l'avant, chacune de ces étapes d'itération se faisant sur la base d'une onde référence adaptée sur la base de l'étape d'itération précédente.
(DE) Die Erfindung betrifft ein Verfahren und eine Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements, insbesondere eines Spiegels oder einer Linse einer mikrolithographischen Projektionsbelichtungsanlage. Ein erfindungsgemäßes Verfahren weist folgende Schritte auf: Durchführen einer Mehrzahl von interferometrischen Messungen, bei welchen jeweils ein Interferogramm zwischen einer von jeweils einem Abschnitt des optischen Elements ausgehenden Prüfwelle und einer Referenzwelle aufgenommen wird, wobei zwischen diesen Messungen die Position des optischen Elements relativ zur Prüfwelle verändert wird, und Berechnen der Passe des optischen Elements auf Basis dieser Messungen, wobei dieses Berechnen iterativ in solcher Weise erfolgt, dass in einer Mehrzahl von Iterationsschritten die Passe des optischen Elements jeweils unter Durchführung einer Vorwärtsrechnung ermittelt wird, wobei jedem dieser Iterationsschritte jeweils eine auf Basis des vorangegangen Iterationsschrittes angepasste Referenzwelle zugrundegelegt wird.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)