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1. (WO2019063245) LITHOGRAPHIC METHOD
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Pub. No.: WO/2019/063245 International Application No.: PCT/EP2018/073663
Publication Date: 04.04.2019 International Filing Date: 04.09.2018
IPC:
G03F 9/00 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
TINNEMANS, Patricius, Aloysius Jacobus; NL
HULSEBOS, Edo, Maria; NL
MEGENS, Henricus, Johannes, Lambertus; NL
ERDAMAR, Ahmet Koray; NL
VERHEES, Loek, Johannes, Petrus; NL
ROELOFS, Willem, Seine, Christian; NL
VAN DE VEN, Wendy, Johanna, Martina; NL
YAGUBIZADE, Hadi; NL
CEKLI, Hakki, Ergun; NL
BRINKHOF, Ralph; NL
VU, Tran, Thanh, Thuy; NL
GOOSEN, Maikel, Robert; NL
VAN T WESTEINDE, Maaike; NL
KOU, Weitian; NL
RIJPSTRA, Manouk; NL
COX, Matthijs; NL
BIJNEN, Franciscus, Godefridus, Casper; NL
Agent:
PETERS, John; NL
Priority Data:
17193637.028.09.2017EP
18164511.028.03.2018EP
18166720.511.04.2018EP
Title (EN) LITHOGRAPHIC METHOD
(FR) PROCÉDÉ LITHOGRAPHIQUE
Abstract:
(EN) A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
(FR) Procédé pour déterminer une ou plusieurs valeurs optimisées d'un paramètre de fonctionnement d'un système de capteur conçu pour mesurer une propriété d'un substrat, le procédé consistant à : déterminer un paramètre de qualité pour une pluralité de substrats; déterminer des paramètres de mesure pour la pluralité de substrats obtenus à l'aide du système de capteur pour une pluralité de valeurs du paramètre de fonctionnement; comparer une variation substrat à substrat du paramètre de qualité et une variation substrat à substrat d'un mappage des paramètres de mesure; et déterminer la ou les valeurs optimisées du paramètre de fonctionnement sur la base de la comparaison.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)