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1. (WO2019063206) METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING PROCESS
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Pub. No.: WO/2019/063206 International Application No.: PCT/EP2018/072605
Publication Date: 04.04.2019 International Filing Date: 22.08.2018
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
TEL, Wim, Tjibbo; NL
MASLOW, Mark, John; NL
VAN INGEN SCHENAU, Koenraad; NL
WARNAAR, Patrick; NL
SLACHTER, Abraham; NL
ANUNCIADO, Roy; NL
VAN GORP, Simon, Hendrik, Celine; NL
STAALS, Frank; NL
JOCHEMSEN, Marinus; NL
Agent:
PETERS, John; NL
Priority Data:
17193430.027.09.2017EP
17200255.207.11.2017EP
18155070.805.02.2018EP
Title (EN) METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING PROCESS
(FR) PROCÉDÉ DE DÉTERMINATION DES PARAMÈTRES DE COMMANDE D'UN PROCESSUS DE FABRICATION DE DISPOSITIF
Abstract:
(EN) Disclosed herein is a method for determining one or more control parameters of a manufacturing process comprising a lithographic process and one or more further processes, the method comprising: obtaining an image of at least part of a substrate, wherein the image comprises at least one feature manufactured on the substrate by the manufacturing process; calculating one or more image-related metrics in dependence on a contour determined from the image, wherein one of the image -related metrics is an edge placement error, EPE, of the at least one feature; and determining one or more control parameters of the lithographic process and/or said one or more further processes in dependence on the edge placement error, wherein at least one control parameter is determined so as to minimize the edge placement error of the at least one feature.
(FR) L'invention concerne un procédé pour déterminer un ou plusieurs paramètres de commande d'un processus de fabrication comprenant un processus lithographique et un ou plusieurs autres processus, le procédé consistant à : obtenir une image d'au moins une partie d'un substrat, l'image comprenant au moins une caractéristique fabriquée sur le substrat par le processus de fabrication ; calculer un ou plusieurs indices de mesure relatifs à l'image en fonction d'un contour déterminé à partir de l'image, l'un des indices de mesure relatifs à l'image étant une erreur de placement de bord, EPE, de ladite caractéristique ; et déterminer un ou plusieurs paramètres de commande du processus lithographique et/ou desdits autres processus en fonction de l'erreur de placement de bord, au moins un paramètre de commande étant déterminé de manière à réduire au minimum l'erreur de placement de bord de ladite caractéristique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)