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1. (WO2019063180) CALIBRATION METHOD OF AN INSPECTION TOOL, AND LITHOGRAPHIC APPARATUS
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Pub. No.: WO/2019/063180 International Application No.: PCT/EP2018/071682
Publication Date: 04.04.2019 International Filing Date: 09.08.2018
IPC:
G03F 7/20 (2006.01) ,G01N 21/93 (2006.01) ,G01N 21/956 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
93
Detection standards; Calibrating
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
95
characterised by the material or shape of the object to be examined
956
Inspecting patterns on the surface of objects
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
HOOGENBOOM, Thomas, Leo, Maria; NL
CRAMER, Hugo, Augustinus, Joseph; NL
Agent:
PETERS, John; NL
Priority Data:
17193045.626.09.2017EP
18179618.625.06.2018EP
Title (EN) CALIBRATION METHOD OF AN INSPECTION TOOL, AND LITHOGRAPHIC APPARATUS
(FR) PROCÉDÉ D'ÉTALONNAGE D'UN OUTIL D'INSPECTION, ET APPAREIL LITHOGRAPHIQUE
Abstract:
(EN) A calibration method for an inspection tool, the calibration method comprising determining a calibration parameter of the inspection tool by: receiving data associated with one or more substrates comprising a plurality of target portions onto which a respective plurality of patterns is provided, whereby the plurality of patterns are formed by a semiconductor manufacturing process characterized by a known variation of at least one process parameter with respect to a nominal value; determining a characteristic of each of the plurality of patterns based on the received data; and determining the calibration parameter of the inspection tool, based on the measured characteristics and the known process parameter variation.
(FR) L'invention concerne un procédé d'étalonnage pour un outil d'inspection, le procédé d'étalonnage consistant à déterminer un paramètre d'étalonnage de l'outil d'inspection en: recevant des données associées à un ou plusieurs substrats comprenant une pluralité de parties cibles sur lesquelles une pluralité respective de motifs est fournie, la pluralité de motifs étant formée par un procédé de fabrication de semi-conducteur caractérisé par une variation connue d'au moins un paramètre de processus par rapport à une valeur nominale; en déterminant une caractéristique de chacun de la pluralité de motifs sur la base des données reçues; et en déterminant le paramètre d'étalonnage de l'outil d'inspection, sur la base des caractéristiques mesurées et de la variation de paramètre de processus connue.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)