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1. (WO2019063074) MASK ARRANGEMENT FOR MASKING A SUBSTRATE, APPARATUS FOR PROCESSING A SUBSTRATE, AND METHOD THEREFOR
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Pub. No.: WO/2019/063074 International Application No.: PCT/EP2017/074503
Publication Date: 04.04.2019 International Filing Date: 27.09.2017
IPC:
C23C 14/04 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
Applicants:
HEYMANNS, Matthias [DE/DE]; DE (US)
VERCESI, Tommaso [IT/DE]; DE (US)
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors:
HEYMANNS, Matthias; DE
VERCESI, Tommaso; DE
Agent:
ZIMMERMANN & PARTNER PATENTANWÄLTE MBB; Josephspitalstr. 15 80331 München, DE
Priority Data:
Title (EN) MASK ARRANGEMENT FOR MASKING A SUBSTRATE, APPARATUS FOR PROCESSING A SUBSTRATE, AND METHOD THEREFOR
(FR) AGENCEMENT DE MASQUE POUR LE MASQUAGE D'UN SUBSTRAT, APPAREIL DE TRAITEMENT D'UN SUBSTRAT ET PROCÉDÉ ASSOCIÉ
Abstract:
(EN) A mask arrangement (100) for masking a substrate during deposition in a processing chamber is described. The mask arrangement (100) includes a mask frame (110) for holding a mask (115), and a mask carrier (120) for holding the mask frame (110), wherein the mask frame (110) is connected to the mask carrier (120) by a compliant support (130).
(FR) L'invention concerne un agencement de masque (100) pour le masquage d'un substrat lors du dépôt dans une chambre de traitement. L'agencement de masque (100) comprend un cadre de masque (110) pour maintenir le masque (115), et un support de masque (120) pour maintenir le cadre de masque (110), le cadre de masque (110) étant relié au support de masque (120) par un support souple (130).
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)