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1. (WO2019062232) MASK PLATE AND FABRICATION METHOD THEREFOR
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Pub. No.: WO/2019/062232 International Application No.: PCT/CN2018/093329
Publication Date: 04.04.2019 International Filing Date: 28.06.2018
IPC:
C23C 14/04 (2006.01) ,C23C 14/24 (2006.01) ,H01L 51/56 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
鄂尔多斯市源盛光电有限责任公司 ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. [CN/CN]; 中国内蒙古自治区鄂尔多斯市 东胜区鄂尔多斯装备制造基地 Ordos Equipment Manufacturing Base, Dongsheng District Ordos, Inner Mongolia 017020, CN
Inventors:
林治明 LIN, Zhiming; CN
黄俊杰 HUANG, Chunchieh; CN
张健 ZHANG, Jian; CN
白音必力 BAIYIN, Bili; CN
郝志元 HAO, Zhiyuan; CN
辛小林 XIN, Xiaolin; CN
张德 ZHANG, De; CN
刘旭 LIU, Xu; CN
张新建 ZHANG, Xinjian; CN
Agent:
北京律智知识产权代理有限公司 BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD.; 中国北京市 朝阳区慧忠路5号B1605、B1606、B1607 B1605, B1606, B1607, No. 5 Huizhong Road, Chaoyang District Beijing 100101, CN
Priority Data:
201710890369.827.09.2017CN
Title (EN) MASK PLATE AND FABRICATION METHOD THEREFOR
(FR) PLAQUE DE MASQUE ET SON PROCÉDÉ DE FABRICATION
(ZH) 掩模板及掩模板制作方法
Abstract:
(EN) A mask plate, comprising a plurality of mask units (10). The mask units (10) comprise an active vapor deposition area (101) and a plurality of welding areas (102) distributed at the periphery of the active vapor deposition area (101) according to a preset rule. The welding areas (102) at the periphery of the active vapor deposition areas (101) of the mask units (10) located in the edge area of the mask plate and those of the mask units (10) located inside of the mask plate have the same distribution. The described mask plate may facilitate the improvement of a folding state of the mask units (10) at both the central area and edge area of the mask plate. Further disclosed is a fabrication method for the mask plate.
(FR) La présente invention concerne une plaque de masque, comprenant une pluralité d’unités de masque (10). Les unités de masque (10) comprennent une zone de dépôt de vapeur active (101) et une pluralité de zones de soudage (102) réparties à la périphérie de la zone de dépôt de vapeur active (101) selon une règle prédéfinie. Les zones de soudage (102) à la périphérie des zones de dépôt de vapeur active (101) des unités de masque (10) situées dans la zone de bord de la plaque de masque et celles des unités de masque (10) situées à l’intérieur de la plaque de masque ont la même distribution. La plaque de masque décrite peut faciliter l’amélioration d’un état de pliage des unités de masque (10) au niveau de la zone centrale et de la zone de bord de la plaque de masque. L’invention concerne en outre un procédé de fabrication de la plaque de masque.
(ZH) 一种掩模板,包括多个掩模单元(10),掩模单元(10)包括蒸镀有效区(101)以及位于蒸镀有效区(101)周边按预设规则分布的多个焊接区(102),且位于掩模板边缘区域的掩模单元(10)与位于掩模板内部区域的掩模单元(10)的蒸镀有效区(101)周边的焊接区(102)分布一致。可以帮助改善掩模板中央区域以及边缘区域的掩模单元(10)的褶皱状态。还公开了一种掩模板的制作方法。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)