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1. (WO2019061736) METHOD FOR MANUFACTURING OLED DISPLAY AND OLED DISPLAY
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Pub. No.: WO/2019/061736 International Application No.: PCT/CN2017/111431
Publication Date: 04.04.2019 International Filing Date: 16.11.2017
IPC:
H01L 27/32 (2006.01) ,H01L 51/56 (2006.01) ,H01L 21/77 (2017.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28
including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32
with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
77
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
Applicants:
深圳市华星光电半导体显示技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省深圳市 光明新区公明街道塘明大道9-2号 No.9-2, Tangming Road, Gongming Street, Guangming New District Shenzhen, Guangdong 518132, CN
Inventors:
唐甲 TANG, Jia; CN
张晓星 ZHANG, Xiaoxing; CN
Agent:
深圳市德力知识产权代理事务所 COMIPS INTELLECTUAL PROPERTY OFFICE; 中国广东省深圳市 福田区上步中路深勘大厦15E Room 15E Shenkan Building, Shangbu Zhong Road, Futian District Shenzhen, Guangdong 518028, CN
Priority Data:
201710899825.528.09.2017CN
Title (EN) METHOD FOR MANUFACTURING OLED DISPLAY AND OLED DISPLAY
(FR) PROCÉDÉ DE FABRICATION DE DISPOSITIF D'AFFICHAGE OLED ET DISPOSITIF D'AFFICHAGE OLED
(ZH) OLED显示器的制作方法及OLED显示器
Abstract:
(EN) A method for manufacturing an OLED display and an OLED display. The method for manufacturing an OLED display comprises: forming an anti-reflection layer (200) on an anode layer (120) of a TFT substrate (100); then coating the anti-reflection layer (200) and the TFT substrate (100) with a negative photoresist materials; and exposing and developing the negative photoresist material to form a pixel defining layer (300). Due to the existence of the anti-reflection layer (200), it can be effectively avoided that when the anode layer (120) having a structure where a silver layer is sandwiched between two indium tin oxide layers is used, exposure light for exposing the negative photoresist material is reflected by the anode layer (120) to the negative photoresist material corresponding to a pixel region (101) so that a photoresist residue is generated at the pixel region (101), such that the film thickness of an OLED light-emitting layer (400) manufactured subsequently in the pixel region (101) becomes uniform and the display quality of an OLED display is improved.
(FR) L'invention concerne un procédé de fabrication d'un dispositif d'affichage OLED et un dispositif d'affichage OLED. Le procédé de fabrication d'un dispositif d'affichage OLED comprend : la formation d'une couche antireflet (200) sur une couche d'anode (120) d'un substrat TFT (100) ; puis le revêtement de la couche antireflet (200) et du substrat TFT (100) avec des matériaux à base de résine photosensible négative ; et l'exposition et le développement du matériau à base de résine photosensible négative pour former une couche de définition de pixels (300). En raison de l'existence de la couche antireflet (200), lors de l'utilisation de la couche d'anode (120) présentant une structure dans laquelle une couche d'argent est prise en sandwich entre deux couches d'oxyde d'indium-étain, il est possible d'éviter de façon efficace qu'une lumière d'exposition permettant d'exposer le matériau à base de résine photosensible négative soit réfléchie par la couche d'anode (120) vers le matériau à base de résine photosensible négative correspondant à une région de pixels (101) de manière à ce qu'un résidu de résine photosensible soit généré au niveau de la région de pixels (101), de telle sorte que l'épaisseur de film d'une couche électroluminescente OLED (400) fabriquée par la suite dans la région de pixels (101) devienne uniforme et la qualité d'affichage d'un dispositif d'affichage OLED soit améliorée.
(ZH) 一种OLED显示器的制作方法及OLED显示器。该OLED显示器的制作方法,在TFT基板(100)的阳极层(120)上形成防反射层(200),而后再在防反射层(200)及TFT基板(100)上涂布负性光阻材料,并对负性光阻材料进行曝光及显影形成像素定义层(300),由于防反射层(200)的存在,能够有效避免在采用两层氧化铟锡夹一层银的结构的阳极层(120)时,对负性光阻材料进行曝光的曝光光线被阳极层(120)反射至与像素区域(101)对应的负性光阻材料上使像素区域(101)产生光阻残留,从而使后续制作在像素区域(101)内的OLED发光层(400)的膜厚均匀,提升OLED显示器的显示品质。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)