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1. WO2019058855 - PLASMA TREATMENT DEVICE

Publication Number WO/2019/058855
Publication Date 28.03.2019
International Application No. PCT/JP2018/031000
International Filing Date 22.08.2018
IPC
B01J 19/08 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
H05H 1/46 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1Generating plasma; Handling plasma
24Generating plasma
46using applied electromagnetic fields, e.g. high frequency or microwave energy
CPC
B01J 19/08
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
H05H 1/46
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
1Generating plasma; Handling plasma
24Generating plasma
46using applied electromagnetic fields, e.g. high frequency or microwave energy
Applicants
  • 住友理工株式会社 SUMITOMO RIKO COMPANY LIMITED [JP]/[JP]
  • 国立大学法人名古屋大学 NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY [JP]/[JP]
Inventors
  • 笹井 建典 SASAI Kensuke
  • 豊田 浩孝 TOYODA Hirotaka
Agents
  • 藤谷 修 FUJITANI Osamu
  • 一色 昭則 ISSHIKI Akinori
  • 角谷 智広 KADOYA Tomohiro
Priority Data
2017-18012720.09.2017JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PLASMA TREATMENT DEVICE
(FR) DISPOSITIF DE TRAITEMENT AU PLASMA
(JA) プラズマ処理装置
Abstract
(EN)
The purpose of the present invention is to provide a plasma treatment device which performs uniform plasma treatment on a liquid. This plasma treatment device (100) comprises: a coaxial waveguide comprising a first inner conductor (110), a second inner conductor (120) and an outer conductor (130); a microwave generation unit (150); and a plasma generation region (PG1). The first inner conductor (110) and the second inner conductor (120) have, respectively, a first flow path (LP1) and a second flow path (LP2) for allowing a liquid to flow therein. A first protrusion (111) of the first inner conductor (110) and a second protrusion (121) of the second inner conductor (120) are opposite of each other in a non-contacting state. The plasma generation region (PG1) is a region along where the first protrusion (111) of the first inner conductor (110) and the second protrusion (121) of the second inner conductor (120) are opposite of each other.
(FR)
Le but de la présente invention est de fournir un dispositif de traitement au plasma qui effectue un traitement par plasma uniforme sur un liquide. Ce dispositif de traitement au plasma (100) comprend : un guide d'ondes coaxial comprenant un premier conducteur interne (110), un second conducteur interne (120) et un conducteur externe (130); une unité de génération de micro-ondes (150); et une région de génération de plasma (PG1). Le premier conducteur interne (110) et le second conducteur interne (120) ont, respectivement, un premier chemin d'écoulement (LP1) et un second chemin d'écoulement (LP2) pour permettre à un liquide de s'y écouler. Une première saillie (111) du premier conducteur interne (110) et une seconde saillie (121) du second conducteur interne (120) sont opposées l'une à l'autre dans un état sans contact. La région de génération de plasma (PG1) est une région le long de laquelle la première saillie (111) du premier conducteur interne (110) et la seconde saillie (121) du second conducteur interne (120) sont opposées l'une à l'autre.
(JA)
本技術の目的は、液体に均一なプラズマ処理を実施することを図ったプラズマ処理装置を提供することである。プラズマ処理装置(100)は、第1の内導体(110)と第2の内導体(120)と外導体(130)とを備える同軸導波管と、マイクロ波発生部(150)と、プラズマ発生領域(PG1)と、を有する。第1の内導体(110)および第2の内導体(120)は、それぞれ、内部に液体を流すための第1の流路(LP1)および第2の流路(LP2)を有する。第1の内導体(110)の第1の凸部(111)と第2の内導体(120)の第2の凸部(121)とは、非接触状態で対面している。プラズマ発生領域(PG1)は、第1の内導体(110)の第1の凸部(111)と第2の内導体(120)の第2の凸部(121)との対面箇所に沿う領域である。
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